vacuum PVD DC magnetron plasma sputtering coating equipment

Compared with similar vacuum PVD plasma sputtering equipment, the single target
magnetron sputtering coater is not only widely used, but also has the advantages of
small size and easy operation, and is an ideal equipment for preparing material
films in a laboratory.This device can be used for preparing single-layer
ferroelectric thin films, conductive films, alloy films, and the like.

Technical parameter
Sample stage Size:φ185mm
Temperature   control accuracy:±1℃
Heating temperature:Max 500℃
Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head 2”×1 (1”,2”,3”, 4”optional)
Circulating water chiller with flow rate of 10L/min
Vacuum chamber Chamber size:φ300mm×300mm
Watch window:φ100mm
Chamber material:Stainless steel
Opening mode:Top cover open
Mass flowmeter 2 channels; measuring range 100sccm; 100sccm (can be customized
according to customer needs)
Vacuum system Model:CY-GZK103-A
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa
Power supply:AC;220V 50/60Hz
Pumping rate:Molecular pump: 600L/S    rotary vane pump: 1.1L/S Comprehensive gas
pumping performance: vacuum up to 1.0E-3Pa in 20   minutes
Power   configuration DC power supply×1;Max output power:1500W
Other   parameters Supply   voltage:AC220V,50Hz
Overall  size:600mm×650mm×1280mm
Total power:3KW
Total Weight:300kg

Minimum Order: 1 sets

Click to Enlarge