vacuum carbon W thermal evaporation and plasma sputtering

Multi-function coating machine: Plasma Sputtering + Evaporating + Carbon Coating
The multi-function coating machine can perform vacuum carbon evaporation, vacuum
thermal evaporation and plasma sputtering. It can also perform a variety of ion
treatments under the protection of high-purity argon. By changing the function kit,
the device can quickly switch between multiple functions, which is very suitable
for making SEM samples in the laboratory. This instrument is equipped with a
mechanical pump and a molecular pump, which can meet a variety of vacuum
requirements, especially high vacuum, and can effectively improve the quality of
coating.

Technical parameters:
1. Product model CY-PEC250G-HV
2. Vacuum chamber Bell jar: φ250x340mm
3. Evaporated glass isolation cover size: φ88x150mm with side opening hole
4. Plasma sputtering glass-plated isolation cover size: φ88x150mm
5. Intake system Equipped with manual fine-tuning valve, the interface is
1/4 inch ferrule connector
6. Power requirements AC 220V 50Hz
7. Plasma sputtering set Sputtering voltage 1600V
Maximum current 50mA
Target size 2 inches
Working vacuum 10Pa~20Pa
Working atmosphere Requires high purity argon
8. Thermal evaporation coating set
Number of evaporation sources:2
Max. current 100A
Working vacuum 10^-3Pa
Working atmosphere Do not need any gas.
Sample stage Diameter φ60mm, rotatable
9. Carbon evaporation set Evaporation method Carbon rod evaporation
Max. current 160A
Working vacuum 10^-3Pa
Working atmosphere Do not need any gas.
10. Vacuum system Product model CY-GZK103-A
Molecular pump Turbomolecular pump
Backing pump Two-stage rotary vane pump
Pumping rate Molecular pump: 600L/S
Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa
Rotary vane pump: 1.1L/S
Ultimate vacuum 5×10E-4Pa
Pumping port KF40
Exhaust interface KF16
Vacuum measurement Compound vacuum gauge

Minimum Order: 1 sets

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