three targets RF magnetron co-sputtering coater

Compared with similar plasma sputtering equipment, the three-target magnetron
sputtering coating machine is not only widely used, but also has the advantages of
small size and easy operation, and is an ideal equipment for preparing a material
film in a laboratory.
The device can be used for preparing single or multi-layer ceramic films,
dielectric films, optical films, oxide films, hard films, PTFE films, and the like.

Features
1.There are 1-inch or 2-inch magnetron targets for you to choose. Customers can
choose the target according to the size of the substrate to be coated.
2.The device is equipped with three 300W RF power supply. The RF power supply can
be used for the preparation of non-metal. The three targets can meet the needs of
multi-layer or multiple coatings. If customers have other coating needs, DC power
supply and pulse power supply can be customized. Various types of power supply are
available from 300W to 1000W in various specifications.
3.The coating machine is equipped with two-channel high-precision mass flowmeter.
If you have other requirements, you can customize the gas path of up to four-
channel mass flowmeters to meet the complex gas environment construction
requirements.
4.The instrument is equipped with advanced turbomolecular pump sets, the ultimate
vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for
purchase. Molecular pump gas path is controlled by multiple solenoid valves, you
can open the chamber to take out the sample without shutting down the pump, greatly
improving your work efficiency.
5.This product can be equipped with an integrated industrial computer to control
the system. In the computer program, most functions such as vacuum pump control and
sputtering power control can be realized, which can further improve your
experimental efficiency.

Minimum Order: 1 sets

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