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Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target. High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality of materials. High thermal conductivity: the thermal conductivity of the metal target is particularly high, which can be cooled quickly and improve the coating speed. Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable electrical conductivity of oxides with semiconductor characteristics. * Maximum sizes of planar target        Thickness: 30mm (can be 60mm for round target)        Width: max 2000mm        Length: max 4000mm     * Maximum sizes of rotary target        Vacuum/Air Spraying             Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm             Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm             Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm             Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm        Bonding             Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm    

Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials. Uniform grain: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes Manufacturing processes depend on the properties of the target material and its application. We have (Vacuum melting, Rolling, Vacuum spraying, Atmospheric spraying, Vacuum hot pressing, Hot Isostatic Pressing (HIP), Cold Isostatic Pressing +Various atmosphere sintering technology, Low temperature metal, Vacuum hot pressing sintering technology, Electron beam melting, Zone melting purification, Vacuum directional solidification technology, etc). For metal and alloy target, we adopt Vacuum melting, Rolling, Low temperature metal,Vacuum hot pressing sintering, Electron beam melting, Zone melting purification, Vacuum directional solidification technology. Both Planar and Rotary target available Planar target Planar targets mainly refer to circular targets and rectangular targets with certain thickness. The plane target material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to the substrate under vacuum conditions, and then the film is processed by various methods to meet different needs. Rotary target Rotary target is a magnetically controlled target. The target is shaped like a cylinder containing a stationary magnet for rotation. Its advantage is high utilization rate, the disadvantage is high cost. Reference size * Maximum sizes of planar target    Thickness: 30mm (can be 60mm for round target)    Width: max 2000mm    Length: max 4000mm * Maximum sizes of rotary target    Vacuum/Air Spraying    Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm    Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm    Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm    Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm  Bonding  Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm * Maximum sizes of planar target    Thickness: 30mm (can be 60mm for round target)    Width: max 2000mm    Length: max 4000mm * Maximum sizes of rotary target    Vacuum/Air Spraying    Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm    Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm    Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm    Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm  Bonding  Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm ACETRON is a comprehensive company integrated with R& D, manufacturing and selling of PVD coating materials, mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD display & touch panel and surface decoration.

Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials. Uniform grain: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes Manufacturing processes depend on the properties of the target material and its application. We have (Vacuum melting, Rolling, Vacuum spraying, Atmospheric spraying, Vacuum hot pressing, Hot Isostatic Pressing (HIP), Cold Isostatic Pressing +Various atmosphere sintering technology, Low temperature metal, Vacuum hot pressing sintering technology, Electron beam melting, Zone melting purification, Vacuum directional solidification technology, etc). For metal and alloy target, we adopt Vacuum melting, Rolling, Low temperature metal,Vacuum hot pressing sintering, Electron beam melting, Zone melting purification, Vacuum directional solidification technology. Both Planar and Rotary target available Planar target Planar targets mainly refer to circular targets and rectangular targets with certain thickness. The plane target material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to the substrate under vacuum conditions, and then the film is processed by various methods to meet different needs. Rotary target Rotary target is a magnetically controlled target. The target is shaped like a cylinder containing a stationary magnet for rotation. Its advantage is high utilization rate, the disadvantage is high cost. Reference size * Maximum sizes of planar target    Thickness: 30mm (can be 60mm for round target)    Width: max 2000mm    Length: max 4000mm * Maximum sizes of rotary target    Vacuum/Air Spraying    Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm    Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm    Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm    Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm  Bonding  Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm * Maximum sizes of planar target    Thickness: 30mm (can be 60mm for round target)    Width: max 2000mm    Length: max 4000mm * Maximum sizes of rotary target    Vacuum/Air Spraying    Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm    Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm    Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm    Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm  Bonding  Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm Metal sputtering targets are materials extensively utilized in modern industry. They are primarily employed in the sputtering process for thin film deposition across various industries, including semiconductor, electronics, optics, and surface coating. It is a method of transforming a solid material into a liquid or gaseous state and accelerating it to the target surface using physical vapor deposition techniques. It uses ions produced by an ion source to gather at an accelerated rate in a vacuum, forming a high- speed ion beam that bombards a solid surface. The ions exchange kinetic energy with the solid surface atoms, causing the solid surface atoms to leave the solid and deposit on the base surface.If you need any information or a quote please contact us, you can contact our sales team directly or fill out the form below and we will get back to you in time.

Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target. High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality of materials. High thermal conductivity: the thermal conductivity of the metal target is particularly high, which can be cooled quickly and improve the coating speed. Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable electrical conductivity of oxides with semiconductor characteristics. * Maximum sizes of planar target     Thickness: 30mm (can be 60mm for round target)     Width: max 2000mm     Length: max 4000mm     * Maximum sizes of rotary target     Vacuum/Air Spraying     Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm     Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm     Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm     Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm    

Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials. Uniform grain: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. * Maximum sizes of planar target     Thickness: 30mm (can be 60mm for round target)     Width: max 2000mm     Length: max 4000mm     * Maximum sizes of rotary target     Vacuum/Air Spraying     Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm     Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm     Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm     Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm    

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The multi-layer titanium mesh sintered plates made from expanded titanium mesh with varying pore sizes are a novel material extensively employed in the electrolysis and filtration industries. These plates find wide-ranging applications, including electrolytic hydrogen and oxygen production, as well as electrolyte filtration and circulation. The multi-layer titanium mesh sintered plates possess remarkable attributes such as exceptional filtration performance, corrosion resistance, and mechanical strength. These qualities position them as vital components within the electrolysis process, enhancing productivity, product quality, while simultaneously reducing energy consumption and maintenance costs. Technical Specifications Material: Grade 1 Titanium (Ti) Size: 50x50mm Thickness: 2.0mm Manufacturing Technique: Sintering multiple layers of Ti expanded mesh with different pore sizes Key Features High-Temperature Stability: The multi-layer titanium mesh sintered plates exhibit excellent stability even in high-temperature electrolysis environments. They withstand the heat generated by electrolysis reactions and high-temperature electrolytes without deforming or compromising performance. Excellent Electrical Conductivity: Due to their composition of titanium, these plates possess excellent electrical conductivity. This property facilitates efficient current transmission during electrolysis, ensuring smooth progress of the reaction. Adjustable Pore Structure: The pore structure of the multi-layer titanium mesh sintered plates can be customized based on specific requirements. By controlling the sintering process and arrangement of titanium wire mesh, plates with diverse pore sizes and porosity can be achieved to suit various electrolyte and filtration needs. Longevity and Durability: Crafted from high-quality titanium material, these plates exhibit exceptional corrosion resistance and durability. They deliver prolonged and stable performance, minimizing the need for frequent replacement or maintenance, thereby reducing production costs. Applications Electrolytic Hydrogen Production: Multi-layer titanium mesh sintered plates play a crucial role in electrolytic hydrogen production. They serve as separator membranes between the anode and cathode in electrolyzers, efficiently enabling the separation of hydrogen and oxygen. This enhances hydrogen production efficiency and reduces energy consumption. Electrolytic Oxygen Production: In industries like chemicals and steel manufacturing, multi-layer titanium mesh sintered plates are employed in electrolytic oxygen production. They effectively separate oxygen from other gases, providing a pure oxygen supply to meet production requirements. Electrolyte Filtration: These plates serve as electrolyte filters, removing solid particles and impurities from the electrolyte. This ensures the purity of the electrolyte, contributing to stable and efficient electrolysis processes. Electrolyte Circulation: For electrolysis, the multi-layer titanium mesh sintered plates function as filters for circulating fluids within the electrolytic cell. They effectively filter out suspended solids and impurities in the electrolyte, maintaining its cleanliness and extending the lifespan of the electrolytic cell.

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Inductive components, such as inductors and transformers, are essential in electronics, aiding in energy storage, signal processing, and filtering. These electronic component types store energy in a magnetic field, playing a pivotal role in the functionality and efficiency of various electronic systems. Specific Information for Inductive Components Inductive components are passive electric circuit components that use the principle of electromagnetic induction to store and transfer energy. They are widely used in various electronic circuits and systems. Here is some specific information about inductive components: Types of Inductive Components: The most common types of inductive components include inductors, transformers, and chokes. Inductors: Inductors are passive electrical components that store energy in a magnetic field when an electric current flows through them. They are typically made of a coil of wire wound around a core material, such as iron or ferrite. 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