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| Summary of 12/23/24 11:04 GMT: | >> Show Compact View |
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CY-MSP210S-RFDC desktop dual-target magnetron sputtering coating instrument. The equipment has been miniaturized, while retaining the high-vacuum stainless steel cavity, while simplifying other mechanisms, limiting the shape of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a DC power supply and an RF power supply. The DC target can be used for sputtering of metals and other conductive materials. The RF power supply can be used for sputtering of various non-metals and metal oxides. The equipment vacuum system adopts all imported vacuum pumps, with fast pumping speed, high ultimate vacuum and excellent vacuum performance. The equipment has compact structure, perfect functions and easy to use. It is very suitable for various coating tests. Technical parameter Sample stage:Size:φ150mm;heating Up to 500℃;Rotating speed:0-20 adjustable Magnetron sputtering target 2” x2 dual targets share a baffle Vacuum chamber Cavity size:φ210mm X 230mm Observation window:φ40mm Cavity material:SS304 stainless steel Opening method:Front door Vacuum system Mechanical pump:Imported oil-free diaphragm pump Pumping interface:KF16 Molecular pump:Imported molecular pump Pumping interface:KF40 Vacuum measurement:Resistance gauge + ionization gauge Exhaust interface:KF16 Ultimate vacuum:1.0E-3Pa Power supply:AC 220V 50/60Hz Pumping rate:Oil-free pump 0.49L/s Molecular pump: 40L/S Sputtering power DC power supply x1 RF power supply x1 Maximum output power DC power supply 500W RF power supply 500W other Supply voltage:AC220V, 50Hz Overall size:550mm X 550mm X1100mm Total power:2kW
Minimum Order: 1 bags
Phone:
Fax:
Email:
+8637155199322
No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
Zhengzhou 450000
China
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Compared with similar vacuum PVD equipment, the single-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for research on solid electrolyte and OLED in the laboratory.RF magnetron sputteringcan be used to prepare single-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Sample stage Size:φ185mm Temperature control accuracy:±1℃ Heating temperature:Max 500℃ Rotate speed:1-20rpm adjustable Magnetron Sputtering target head 2”×1 (1”,2”,3”optional) Circulating water chiller with flow rate of 10L/min Vacuum chamber Chamber size:φ300mm×300mm Watch window:φ100mm Chamber material:Stainless steel Opening mode:Top cover removable Mass flow meter 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) Vacuum system Model:CY-GZK103-A Pumping interface:KF40 Molecular pump:CY-600 Exhaust interface:KF16 Backing pump:rotary vane pump Vacuum measurement:Compound vacuum gauge Ultimate vacuum:1.0E-5Pa Power supply:AC;220V 50/60Hz Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes Power configuration RF power supply ×1;Max output power:300W Other parameters Supply voltage:AC220V,50Hz Overall size:600mm×650mm×1280mm Total power:2KW Total Weight:300kg
Minimum Order: 1 bags
Phone:
Fax:
Email:
+8637155199322
No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
Zhengzhou 450000
China
)
Compared with similar vacuum PVD plasma sputtering equipment, the single target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.This device can be used for preparing single-layer ferroelectric thin films, conductive films, alloy films, and the like. Technical parameter Sample stage Size:φ185mm Temperature control accuracy:±1℃ Heating temperature:Max 500℃ Rotate speed:1-20rpm adjustable Magnetron Sputtering target head 2”×1 (1”,2”,3”, 4”optional) Circulating water chiller with flow rate of 10L/min Vacuum chamber Chamber size:φ300mm×300mm Watch window:φ100mm Chamber material:Stainless steel Opening mode:Top cover open Mass flowmeter 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) Vacuum system Model:CY-GZK103-A Pumping interface:KF40 Molecular pump:CY-600 Exhaust interface:KF16 Backing pump:rotary vane pump Vacuum measurement:Compound vacuum gauge Ultimate vacuum:1.0E-5Pa Power supply:AC;220V 50/60Hz Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes Power configuration DC power supply×1;Max output power:1500W Other parameters Supply voltage:AC220V,50Hz Overall size:600mm×650mm×1280mm Total power:3KW Total Weight:300kg
Minimum Order: 1 bags
Phone:
Fax:
Email:
+8637155199322
No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
Zhengzhou 450000
China
)
CY-MSP180G-DC Desktop single sputter head magnetron sputtering coater This equipment is a desktop single sputter head magnetron sputtering coating machine. The miniaturized design of the equipment limits the appearance of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a DC power supply, which can be used for sputtering metal materials and has the characteristics of fast speed and low temperature rise. Technical parameters: Sample stage Size φ100mm Heating Max. 500℃ Rotating speed 0-20rpm adjustable Magnetron sputtering head Quantity 2" x1 Vacuum chamber Chamber size φ180mm x 215mm Observation window Omnidirectional transparent Chamber material High purity quartz Open method Upper cover removable Vacuum system Mechanical pump Rotary vane pump Pumping port KF16 Exhaust interface KF16 Molecular pump Turbomolecular pump Pumping port KF40 Exhaust interface KF40 Vacuum measurement Resistance gauge + ionization gauge Ultimate vacuum 1.0E-4Pa Power supply AC 220V 50/60Hz Pumping rate Mechanical pump 1.1L/s Molecular pump 600L/s Power configuration Quantity DC power supply x1 Max. output power DC power supply 150W Supply voltage AC220V, 50Hz Others Total power 2kW Overall size 550mm x 350mm x 400mm
Minimum Order: 1 bags
Phone:
Fax:
Email:
+8637155199322
No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
Zhengzhou 450000
China
)
This equipment is a desktop single sputter head magnetron sputtering coating machine. The miniaturized design of the equipment limits the appearance of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a high-performance DC power supply with target refining function, which can effectively remove the oxide layer on the surface of the aluminum target. It is very suitable for aluminum plating and other materials that are very sensitive to air. This equipment has compact structure and perfect function and is easy to use, and is very suitable for various coating tests. Technical parameter Sample stage Size φ100mm Rotating speed 0-20rpm adjustable Heating Max. 500℃ Magnetron sputtering head Quantity 2" x1 Vacuum chamber Chamber size φ180mm x 215mm Observation window Omnidirectional transparent Chamber material High purity quartz Open method Upper cover removable Vacuum system Mechanical pump Rotary vane pump Pumping port KF16 Exhaust interface KF16 Molecular pump Turbomolecular pump Pumping port KF40 Exhaust interface KF40 Vacuum measurement Resistance gauge + ionization gauge Ultimate vacuum 1.0E-4Pa Power supply AC 220V 50/60Hz Pumping rate Mechanical pump 1.1L/s Molecular pump 600L/s Power configuration Quantity DC power supply x1 Max. output power DC power supply 500W Supply voltage AC220V, 50Hz Others Total power 2kW Overall size 550mm x 350mm x 500mm
Minimum Order: 1 bags
Phone:
Fax:
Email:
+8637155199322
No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
Zhengzhou 450000
China
SOURCE: Import-Export Bulletin Board (https://www.imexbb.com/)
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