Labs

This equipment is a desktop single sputter head magnetron sputtering coating machine. The miniaturized design of the equipment limits the appearance of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a high-performance DC power supply with target refining function, which can effectively remove the oxide layer on the surface of the aluminum target. It is very suitable for aluminum plating and other materials that are very sensitive to air. This equipment has compact structure and perfect function and is easy to use, and is very suitable for various coating tests. Technical parameter Sample stage Size φ100mm Rotating speed 0-20rpm adjustable Heating Max. 500℃ Magnetron sputtering head Quantity 2" x1 Vacuum chamber Chamber size φ180mm x 215mm Observation window Omnidirectional transparent Chamber material High purity quartz Open method Upper cover removable Vacuum system Mechanical pump Rotary vane pump Pumping port KF16 Exhaust interface KF16 Molecular pump Turbomolecular pump Pumping port KF40 Exhaust interface KF40 Vacuum measurement Resistance gauge + ionization gauge Ultimate vacuum 1.0E-4Pa Power supply AC 220V 50/60Hz Pumping rate Mechanical pump 1.1L/s Molecular pump 600L/s Power configuration Quantity DC power supply x1 Max. output power DC power supply 500W Supply voltage AC220V, 50Hz Others Total power 2kW Overall size 550mm x 350mm x 500mm

Minimum Order: 1 bags