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Customize pulsed laser sputtering deposition system Pulsed laser deposition system, abbreviated as PLD system, this system consists of two parts: excimer laser and vacuum coating chamber; vacuum coating chamber consists of a sputtering vacuum chamber, a rotating target stage, an anti-oxidation substrate heating stage, a working gas path, gas extraction system, installation machine table, vacuum measurement and electrical control system. 1.Sputtering vacuum chamber size spherical /Ф450mm. Material high-quality stainless steel It is welded by argon arc. The surface is polished by a special process. The interface is sealed with a metal gasket or a fluorine rubber ring 2.Rotating target platform target size(i) Φ60mm and (ii) Φ25mm rotation speed Four targets can be loaded at a time 5~60 rpm, continuously adjustable, target position revolution controlled by the motor-driven magnetic coupling mechanism target material shield The target material shield shields 4 targets, and only one target material is sputtered into the film at a time, so as to avoid cross contamination between the target materials 3.Antioxidant substrate heating table substrate size φ2 ″ substrate can be placed; heating temperature The maximum temperature is 800℃±1℃, controlled by thermocouple closed-loop feedback, and the heater is made of antioxidant material. mode of motion The substrate can rotate continuously, the speed is 5~60 rpm, controlled by the motor-driven magnetic coupling mechanism distance The distance between the substrate and the target platform is adjustable from 30 to 90mm and controlled by a manual bellows adjustment mechanism outside the chamber others Manual control sample baffle components: 1 set; Sample holder: 2; 4.Gas circuit system 2 channels 5.Laser beam scanning control system Two-dimensional scanning mechanical platform, two sets of motor control, or manual control; 6.Other configuration Window and flange interface parts 1 set gas pumping unit, valve, pipeline 1 set 1 set of machine mounting frame assembly :High quality square steel profile welded, quick unloading coaming surface spray treatment; Machine surface with stainless steel skin decoration; four casters can be fixed and movable Vacuum measurement and electrical control system 1 set Computer control system 1 set

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Multi-Arc Ion Plating CY-MIOP400S-2TA This equipment is multi arc ion coating equipment. Multi arc ion plating uses gas discharge or partial dissociation of evaporated materials to deposit evaporated or reactive materials on the substrate at the same time of bombardment by gas ions or particles of evaporated materials. The equipment is equipped with two multi arc targets, which are arranged on both sides of the cavity. With the planetary sample table, the coating efficiency can be effectively improved and the effect can be improved Features 1.The coating instrument also adopts the integrated design, the cavity and the electric control part are left and right separated, realizing the separation of water and electricity, and effectively ensuring the safety of users. 2.The combination of glow discharge, plasma technology and vacuum evaporation can not only improve the film quality, but also expand the application of the film. 3.It has the advantages of fast evaporation rate, strong adhesion, good diffraction and wide film material. It is very suitable for hard protective coating such as TiN. 4.At the same time, the color of the film can be changed by controlling the atmosphere, and the film is firmly combined with the substrate, so it can also be used to make decorative films of various colors.

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The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by vacuum thermal evaporation. The instrument components are highly integrated, which realize two kinds of coating functions in the same chamber. This coating machine adopts high purity quartz chamber as vacuum chamber, and the coating process is completely visible. The instrument is equipped with two stage rotary vane vacuum pump, which can quickly reach the vacuum degree of 1.0E-1pa, and can meet the vacuum environment required by most evaporation coating experiments and diode sputtering experiments. This instrument has small size which can save space and can be used on the test bench. One machine has multiple purposes, which is cost-effective and very suitable for major universities and research institutions to choose.

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CY-EVS180S-HV The plasma sputtering and vacuum thermal evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation. This coating machine 304 stainless steel as vacuum chamber, and the coating process is completely visible. The instrument is equipped with two stage rotary vane vacuum pump, which can quickly reach the vacuum degree of 1.0E-3pa, Ultimate vacuum 1.0E- 5Pa, and can meet the vacuum environment required by most evaporation coating experiments and diode sputtering experiments. Applications: This instrument has small size which can save space and can be used on the test bench. One machine has multiple purposes, which is cost-effective and very suitable for major universities and research institutions to choose. Scanning electron microscope sample surface gold spraying, gold steaming carbon spraying and other operations, as well as the production of non-conductor material test electrode. Technical parameters: Supply voltage AC220V，60Hz Maximum power 1200W Sample Stage Diameter φ65mm; Adjustable distance from evaporation source, adjustable range 60mm-100mm Vacuum chamber Material: 304 stainless steel O.Dφ168mm x I.Dφ160mm x 210mm Maximum temperature 1700℃ Thermocouple B type thermocouple Vacuum gauge Electronic vacuum gauge Vacuum system Foreline pump: Pufa MVP030 oil-free pump, pumping speed 30L / min Secondary pump: Leybold TURBOVAC 90iX pumping speed 90L / s Vacuum interface KF40 Intake port 1/4 card sleeve connector Overall size 500x350x400mm

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The magnetron sputtering vacuum thermal evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. In this device, magnetron sputtering cathode glow discharge is used to sputter the target atoms and partially ionize and deposit them on the substrate to form a film, and at the same time, the metal plating material can be melted in a vacuum by resistance heating and vaporized and then deposited on the substrate to form a film.This increases the utility and flexibility of the device. The equipment is used for metallization of plastic surface such as mobile phone case and deposition of non-conductive film and electromagnetic shielding film. The magnetron sputtering/vacuum evaporation composite coating equipment is equipped with a plasma processing device, a high-efficiency magnetron sputtering cathode and a resistance evaporation device, etc. The deposition rate of this device is fast, the coating adhesion is good, the plating layer is fine and compact, the surface finish is high, the uniformity and consistency is good; the machine realizes full automatic control of coating process, large load, reliable work, high qualification rate, low production cost and green environmental protection. The device is widely used in computer casings, mobile phone cases, household appliances and other industries, and can be coated with metal film, alloy film, composite film layer, transparent (translucent) film, non-conductive film, electromagnetic shielding film and the like.

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CY-MSE310S-DCRF two-in-one coating machine can be used for coating samples of electronic products, glass, ceramic samples, metals and other samples. Especially suitable for laboratory SEM (scanning electron microscope) sample preparation. The equipment is mainly composed of quartz vacuum chamber, plasma sputtering target, evaporation coating device, sample stage for placing samples, vacuum pump unit, vacuum measuring gauge, gas intake system and control system. The main unit of the equipment adopts touch screen operation, and the temperature control meter detects. Its digital parameter interface and automatic operation mode provide users with an excellent R & D platform. The target head is at the bottom of the vacuum chamber. The sample stage has heating and rotating functions, which can make the coating effect more uniform. The equipment’s vacuum acquisition system uses the two-stage vacuum pump set. The backing pump is a large pumping speed mechanical pump, which effectively reduces the time from normal pressure to low vacuum. The main pump is a turbo molecular pump, which has a high pumping speed and a faster vacuum acquisition speed. The overall vacuum obtaining system is clean and fast. The vacuum chamber is made of 304 stainless steel and is equipped with a viewing window and a baffle. Beautiful shape, fine workmanship, excellent vacuum performance. The main sealing flange adopts CF series high vacuum sealing flange. Each joint of the vacuum chamber is sealed by a rubber seal ring, which has excellent vacuum performance and can effectively guarantee the coating quality

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The equipment uses electron beam evaporation as coating equipment. It is mainly used to prepare various conductive thin films, semiconductor thin films, ferroelectric thin films, optical thin films, micro-fabrication of micro and nano devices, sample pretreatment of electron microscopy, etc. It is especially suitable for evaporating various refractory metal materials. It can be used not only on hard substrates such as glass and silicon wafers, but also on flexible substrates such as PDMS, PTFE and PI. Technical parameters of equipment Conditions of use ambient temperature 5 ~40 C Power supply three-phase 380 V Power <20 KW Water pressure <2.5bar Vacuum chamber size evaporation chamber size: Phi 500 *H500 Electronic gun a new type of electronic gun, 6-hole crucible Sample turntable Sample size: <150mm, sample can be rotated, and the distance between sample and electron gun can be adjusted up and down (Sample holder shape is designed according to user's requirements), heating temperature <500 C. System Vacuum Limit vacuum: baked for 12 to 24 hours, continuously pumped less than 5x10-5Pa Pumping Rate: Vacuum < 5x10-4Pa within 40 minutes from atmospheric start System Leakage Rate: Measuring Vacuum Vacuum Degree of Vacuum Chamber < 10Pa after 12 hours of shutdown Vacuum pumping system FB1200 molecular pump + mechanical pump (TRP-36) system with bypass pumping Coating monitoring SQM160 film thickness meter is used for monitoring. Coating thickness The unevenness of coating thickness is less than 6%

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This equipment is a multi-source high-vacuum evaporation coating instrument. The equipment adopts a front-opening vacuum chamber design. The chamber has a large space and strong expandability, which can meet the evaporation coating of multiple types of large-size samples. The chamber has an upper sample stage inside, and the clamping or clamping type sample mounting parts can be selected according to the user's sample style. The sample table can be rotated, heated and raised and lowered, and all operations are integrated and controlled through the touch screen. The vacuum pump set of the equipment is a two-stage vacuum system, which is composed of a dual stage rotary vane vacuum pump and a turbo molecular pump. It can provide a clean and oil-free high vacuum environment for the vacuum coating test; the vacuum system contains a complete pneumatic valve system, and the user can One- touch operation through the touch screen realizes vacuuming, non-stop load and unload sample, complete shutdown and other operations. The equipment has two sets of evaporation sources. It adopts a tungsten boat evaporation source and water-cooled copper electrodes. It can support a maximum current of 300A and a heating temperature of up to 3000 ° C. It can realize the evaporation of various refractory metals. This equipment adopts an integrated design, and the chamber and the electric control part are separated left and right, which realizes the separation of water and electricity, and effectively guarantees the safety of users. The electric control part adopts the design of the combination of touch screen and button panel. The vacuum system, sample table and other auxiliary functions are operated by the touch screen with one button. The evaporation and the film thickness control are operated independently by the panel, which is as convenient for users as possible while avoiding the possibility of wrong operation. The equipment is well-designed and has excellent performance, and it is an indispensable choice for laboratory high-precision evaporation coating test. Technical parameters Sample stage Size Max support φ150mm sample Height Adjustable up and down 70mm Evaporation source Quantity Tungsten Boat x2 Vacuum chamber Chamber size:Dia. 300mm X 400mm Observation window:Front φ100mm with shading sheet Chamber material:304 stainless steel Opening method:Front door open Film thickness control Crystal vibrating film thickness measuring instrument, optional multi-channel film thickness controller Vacuum system Backing pump:Dual stage rotary vane pump Pumping port:KF16 Secondary pump:Turbo molecular pump Pumping port:CF160 Vacuum measurement Resistance + ionization Compound vacuum gauge Exhaust rate:Mechanical pump 1.1L / s Molecular pump 600L / s Ultimate vacuum:1.0E-5Pa Power supply:AC 220V 50/60Hz Pumping rate:Rotary vane pump: 1.1L / S Flowmeter One way mass flowmeter 500sccm Ar gas Control System PLC automatic control Operation interface: touch screen + operation panel Other Supply voltage:AC380V,50Hz Machine size:1000mm x 800mm x 1500mm Total power:5kW Machine weight:350kg

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Small stainless steel chamber high vacuum thermal evaporation coater The instrument is a high vacuum compact thermal evaporation coater with evaporation temperature from 200℃ to 1700℃. The tungsten wire basket is used as the evaporation source, and the evaporation source is built in at the bottom of high purity alumina crucible. The upper cover is equipped with a rotatable sample stage, which can effectively improve the uniformity of film formation. The instrument has a high-precision temperature control system and uses circulating heating method, which can stabilize the evaporation of metals and organic matter. Stainless steel high-vacuum chamber design, with high-precision molecular pump, can achieve high vacuum requirements, the high vacuum can effectively improve the efficiency and quality of the evaporation coating. Application This equipment is suitable for evaporation coating of most metals and certain organic material films. Technical parameters: Small high vacuum thermal evaporation coater Sample stage Size:Φ65mm Distance to evaporation source:60mm~100mm adjustable Rotary speed:1-20rpm adjustable Evaporation system Evaporation source:Tungsten wire basket Max temperature:1700℃ Thermocouple:S type thermocouple Vacuum chamber Chamber size:φ170mm × 200mm Observation Window:Quartz observation window φ70 Chamber material:Stainless steel Opening way:Top cover open Vacuum system Model:CY-GZK103-A Pumping interface:KF40 Exhaust interface:KF16 Molecular pump:CY-600 Backing pump:Rotary vane pump Vacuum measurement:Compound vacuum gauge Ultimate vacuum:1.0E-5Pa Pumping rate:Molecular pump: 600L/S rotary Rotary vane pump: 1.1L/S comprehensive pumping performance: 20 minutes vacuum up to: 1.0E-3pa Other parameters Supply voltage:AC220V,50Hz Dimensions:600mm×300mm×47 , 0mm Total power:.5kw Total weight：40kg

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Small temperature-controlled vacuum thermal evaporation coating machine CY-1700X-SPC-2 can set the program and precisely control the temperature to change within the range of 200℃-1500℃. During the evaporation coating of the sample, the sample stage can be rotated to obtain a more uniform film. This model of small program temperature control evaporation coating machine has a wide range of applications, can prepare a variety of metal film and organic film, so it is widely used in the preparation of electrodes and the preparation of organic light-emitting LEDs. The compact size of the instrument saves laboratory space; it is easy to operate and adaptable to different materials, so it is widely used in laboratories of universities and research institutes. Features: 1. This equipment uses a quartz chamber for easy cleaning and sample placement; 2. The sample stage can be rotated, and the coating effect can be more uniform; 3. Using tungsten wire as the heat source, the maximum temperature can reach 1700℃, and it is equipped with a special alumina boat loading sample (only used below 1600℃, if the evaporation temperature is greater than 1600℃, the sample should be placed directly in the tungsten wire basket); 4. The device can be switched to the manual adjustment state. The thermocouple is not installed inside, and the output current is directly adjusted by the manual. The temperature of the heat source can reach 2000℃, which can meet the experimental requirements for carbon plating of the sample. 5. The inert gas can be introduced into the vacuum chamber to clean the chamber, or the reaction gas can be introduced to carry out the reaction evaporation coating. 6. The air inlet is equipped with a needle valve for regulating the intake air flow.

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Small Vacuum Thermal Evaporation Coating Machine for Glove Box CY-EVP180G-GLV This small thermal evaporator can be used for vacuum evaporation deposition coating and the coating current can reach up to 100A. This type of small evaporation coating instrument has a wide range of applications and can prepare various metal thin films and some non-metal thin films, so it is widely used in electrodes and organic light emitting LED preparation. The instrument has a small size and a miniaturized design, which can effectively save laboratory space. It is specially designed for use in a glove box; it is simple to operate and has strong adaptability to different materials, making it very suitable for laboratory purchases. Characteristics: 1. Quartz chamber, easy to clean and put in samples; 2. Tungsten wire basket or tungsten boat is the heating source, the highest temperature can reach 1700℃; 3. Inert gas can be introduced into the vacuum chamber to clean the chamber, or reactive gas can be introduced to perform reactive evaporation coating. 4. The air inlet is equipped with a needle valve to adjust the air flow. Technical parameter Supply voltage AC220V，60Hz Max power 1000W Sample stage Diameterφ60mm； Quartz chamber O.Dφ180mm x I.Dφ166mm x 100mm Evaporation source Tungsten basket/tungsten boat Max temperature 1700℃ Thermocouple B-type,working temperature 200℃~1500℃ Vacuum gauge Resistance type vacuum gauge Vacuum interface KF16 Inlet interface φ6.35mm Bite type fittings Vacuum pump No, the customer provides it Dimensions 330x250x580mm

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This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This equipment is equipped with a rotatable heating sample stage, which can improve the uniformity of the coating and the adhesion of the film.This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments. Technical parameter Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Heating temperature ≤500℃ Temperature control accuracy ±1℃ PID temperature control Plasma sputtering source 2 inches x3 water cooling Vacuum chamber Chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

Small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low- temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This model machine is also equipped with a rotatable sample stage, which can effectively improve the uniformity of the coating. Technical paremater Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Plasma sputtering source 2 inches x3 Natural cooling Vacuum chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments. Technical parameter Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Plasma sputtering source Quantity 2 inches x3 Cooling method Natural cooling Vacuum chamber Chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags