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Ultrasonic pyrolysis sprayer The spray pyrolysis method is to spray the solution onto a heated base after atomization, and then obtain the desired material structure on the base. This material preparation method is particularly suitable for depositing oxides, and has a long history in the application of preparing transparent electrodes. Now this method is widely used in the preparation of perovskite-type solar cells. This equipment is an ultrasonic spray pyrolysis equipment independently researched and developed by our company. It is equipped with a 40KHz 130W ultrasonic atomizer, a PID temperature-controlled heating substrate, a high-precision peristaltic pump and a precision programmed stepping motor moving mechanism . Through the integrated design, this equipment can precisely control the parameters of the solution output, the spraying speed of the mist particles and the size of the mist particles. At the same time, the substrate temperature can also be controlled, which can meet your various test requirements.  Technical Parameters 1. Supply voltage AC220V，50Hz 2. Maximum power 3.5KW(Including compressor and peristaltic pump about 1.5KW) 3. Ultrasonic atomizer 40KHz 130W 4. Liquid viscosity 1-50mPa·s（cP） 5. Nozzle stroke X-Y axis up to 150mm 6. Moving speed 0-1000mm/min (X-axis)0-1000mm/min (Y-axis) 7. Heated substrate 150mm X 150mm 8. Maximum temperature 500℃ 9. Temperature control method AI-PID 10. Drip tank capacity 250mL 11. Peristaltic pump dispensing rate 0.006-41mL/min 12. Control method Touch screen 13. Overall size 680mm X 580mm X 1100mm

Minimum Order: 1 bags

Dual target magnetron sputter and thermal evaporation composite coating machine CY-MS500S-2TA1S magnetron sputter & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope). The equipment is mainly composed of stainless steel vacuum chamber, magnetron sputtering target, evaporation source, rotary heating sample table, vacuum pump unit, vacuum measurement gauge, air intake system and control system. Features a.Touch screen operation, temperature control meter detection. Digital parameter interface and automatic operation mode provide users with an excellent research and development platform; b.The vacuum chamber is made of 304 stainless steel with observation window and baffle. Beautiful shape, fine workmanship, excellent vacuum performance. The main sealing flange is CF series high vacuum sealing flange. Each interface of vacuum chamber is sealed with rubber seal ring, which has excellent vacuum performance and can effectively ensure the coating quality; c.The target is located at the bottom of the cavity, and the target is upward. The sample table has the function of heating and rotating, which can make the coating effect more uniform;; d.The vacuum acquisition system adopts two-stage vacuum pump group. The backing pump is mechanical pump with high pumping speed, which can effectively reduce the time from atmospheric pressure to low vacuum. The main pump is turbine molecular pump, which has high pumping speed and faster vacuum acquisition speed. The overall vacuum acquisition system is clean and fast. Technical parameter 1. Model CY-MS500S-2TA1S 2.New sample table is available Sample Size For Dia.150mm sample max. Height 70mm adjustable Rotation speed 1~20rpm Heating 0~500℃ 3. Magnetron sputter head,Quantity 2-inch ×2 Cooling mode Water cooled 4. Thermal evaporation evaporator source,Tungsten wire basket Max temp 1500℃,Thermocouple S type   5. Vacuum chamber Size 300mmDia.× 300mmH Watch window 100mm Dia. Material 304 SUS Open mode Front opening door 6. Vacuum system Mechanical pump Rotary vane pump Extraction interface KF16 Pumping 1.1L/s Molecular pump Turbo molecular pump Extraction interface CF150 Pumping 600L/s Exhaust interface KF40 Vacuum gauge Resistance gauge + ionization gauge Ultimate vacuum degree 1.3x10-4Pa Power supply AC;220V 50/60Hz 7. Sputter power supply DC power supply 1 set Output power ≤1000W Output voltage ≤600W Response time ＜5ms RF power supply 1 set Output power ≤1000W Power stability ≤5W RF frequency 13.56MHz RF stability ±0.005% 8. Film thickness gauge Resolution±0.03Hz,Accuracy ±0.5%,Upper range limit 50000 Speed 100~1000ms 9. Water cooled system Tank volume 9L Flow 10L/min 10. Gas system Flowmeter type MFC(mass flow meter),Range 200sccm,Gas type Ar 11. Other Input supply AC220V,50Hz Size 1400x750x1300mm Total power 4kw（host+vacuum pump） Weight 295kg

Minimum Order: 1 bags

Dual target magnetron sputter and thermal evaporation composite coating machine CY-MS500S-2TA1S magnetron sputter & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope). The equipment is mainly composed of stainless steel vacuum chamber, magnetron sputtering target, evaporation source, rotary heating sample table, vacuum pump unit, vacuum measurement gauge, air intake system and control system. Features a.Touch screen operation, temperature control meter detection. Digital parameter interface and automatic operation mode provide users with an excellent research and development platform; b.The vacuum chamber is made of 304 stainless steel with observation window and baffle. Beautiful shape, fine workmanship, excellent vacuum performance. The main sealing flange is CF series high vacuum sealing flange. Each interface of vacuum chamber is sealed with rubber seal ring, which has excellent vacuum performance and can effectively ensure the coating quality; c.The target is located at the bottom of the cavity, and the target is upward. The sample table has the function of heating and rotating, which can make the coating effect more uniform;; d.The vacuum acquisition system adopts two-stage vacuum pump group. The backing pump is mechanical pump with high pumping speed, which can effectively reduce the time from atmospheric pressure to low vacuum. The main pump is turbine molecular pump, which has high pumping speed and faster vacuum acquisition speed. The overall vacuum acquisition system is clean and fast. Technical parameter 1. Model CY-MS500S-2TA1S 2. Sample table Size150mm Dia.;Heating ≤500℃;Rotation speed 1-20r/min;Temp control ±1℃ 3. Magnetron sputter head,Quantity 2-inch ×2 Cooling mode Water cooled 4. Thermal evaporation evaporator source,Tungsten wire basket Max temp 1500℃,Thermocouple S type   5. Vacuum chamber Size 300mmDia.× 300mmH Watch window 100mm Dia. Material 304 SUS Open mode Front opening door 6. Vacuum system Mechanical pump Rotary vane pump Extraction interface KF16 Pumping 1.1L/s Molecular pump Turbo molecular pump Extraction interface CF150 Pumping 600L/s Exhaust interface KF40 Vacuum gauge Resistance gauge + ionization gauge Ultimate vacuum degree 1.3x10-4Pa Power supply AC;220V 50/60Hz 7. Sputter power supply DC power supply 1 set Output power ≤1000W Output voltage ≤600W Response time ＜5ms RF power supply 1 set Output power ≤1000W Power stability ≤5W RF frequency 13.56MHz RF stability ±0.005% 8. Film thickness gauge Resolution±0.03Hz,Accuracy ±0.5%,Upper range limit 50000 Speed 100~1000ms 9. Water cooled system Tank volume 9L Flow 10L/min 10. Gas system Flowmeter type MFC(mass flow meter),Range 200sccm,Gas type Ar 11. Other Input supply AC220V,50Hz Size 1400x750x1300mm Total power 4kw（host+vacuum pump） Weight 295kg

Minimum Order: 1 bags

Multi-function coating machine: Plasma Sputtering + Evaporating + Carbon Coating The multi-function coating machine can perform vacuum carbon evaporation, vacuum thermal evaporation and plasma sputtering. It can also perform a variety of ion treatments under the protection of high-purity argon. By changing the function kit, the device can quickly switch between multiple functions, which is very suitable for making SEM samples in the laboratory. This instrument is equipped with a mechanical pump and a molecular pump, which can meet a variety of vacuum requirements, especially high vacuum, and can effectively improve the quality of coating. Technical parameters: 1. Product model CY-PEC250G-HV 2. Vacuum chamber Bell jar: φ250x340mm 3. Evaporated glass isolation cover size: φ88x150mm with side opening hole 4. Plasma sputtering glass-plated isolation cover size: φ88x150mm 5. Intake system Equipped with manual fine-tuning valve, the interface is 1/4 inch ferrule connector 6. Power requirements AC 220V 50Hz 7. Plasma sputtering set Sputtering voltage 1600V Maximum current 50mA Target size 2 inches Working vacuum 10Pa~20Pa Working atmosphere Requires high purity argon 8. Thermal evaporation coating set Number of evaporation sources:2 Max. current 100A Working vacuum 10^-3Pa Working atmosphere Do not need any gas. Sample stage Diameter φ60mm, rotatable 9. Carbon evaporation set Evaporation method Carbon rod evaporation Max. current 160A Working vacuum 10^-3Pa Working atmosphere Do not need any gas. 10. Vacuum system Product model CY-GZK103-A Molecular pump Turbomolecular pump Backing pump Two-stage rotary vane pump Pumping rate Molecular pump: 600L/S Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa Rotary vane pump: 1.1L/S Ultimate vacuum 5×10E-4Pa Pumping port KF40 Exhaust interface KF16 Vacuum measurement Compound vacuum gauge

Minimum Order: 1 bags

Multi-function coating machine: Plasma Sputtering + Evaporating + Carbon Coating The multi-function coating machine can perform vacuum carbon evaporation, vacuum thermal evaporation and plasma sputtering. It can also perform a variety of ion treatments under the protection of high-purity argon. By changing the function kit, the device can quickly switch between multiple functions, which is very suitable for making SEM samples in the laboratory. This instrument is equipped with a mechanical pump and a molecular pump, which can meet a variety of vacuum requirements, especially high vacuum, and can effectively improve the quality of coating. Technical parameters: 1. Product model CY-PEC250G-HV 2. Vacuum chamber Bell jar: φ250x340mm 3. Evaporated glass isolation cover size: φ88x150mm with side opening hole 4. Plasma sputtering glass-plated isolation cover size: φ88x150mm 5. Intake system Equipped with manual fine-tuning valve, the interface is 1/4 inch ferrule connector 6. Power requirements AC 220V 50Hz 7. Plasma sputtering set Sputtering voltage 1600V Maximum current 50mA Target size 2 inches Working vacuum 10Pa~20Pa Working atmosphere Requires high purity argon 8. Thermal evaporation coating set Number of evaporation sources:2 Max. current 100A Working vacuum 10^-3Pa Working atmosphere Do not need any gas. Sample stage Diameter φ60mm, rotatable 9. Carbon evaporation set Evaporation method Carbon rod evaporation Max. current 160A Working vacuum 10^-3Pa Working atmosphere Do not need any gas. 10. Vacuum system Product model CY-GZK103-A Molecular pump Turbomolecular pump Backing pump Two-stage rotary vane pump Pumping rate Molecular pump: 600L/S Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa Rotary vane pump: 1.1L/S Ultimate vacuum 5×10E-4Pa Pumping port KF40 Exhaust interface KF16 Vacuum measurement Compound vacuum gauge

Minimum Order: 1 bags

Four source high vacuum evaporation coating equipment Model: CY-EVP325S-4S-T This equipment is a four-source high-vacuum evaporation coater. The equipment adopts a front-opening door vacuum chamber design. In addition, the chamber is increased to 500mm. The distance between the sample stage and the evaporation source has a larger adjustment range, which can adapt to various evaporation needs. It avoids the sample being damaged by the high temperature of the evaporation source. The chamber adopts an top sample stage, the sample stage can be rotated, heated and lifted, and all operations can be integrated and controlled through the touch screen. The equipment vacuum system is a two-stage vacuum system composed of a two- stage rotary vane pump and a turbo molecular pump, which can provide a clean and oil-free high vacuum environment. The equipment is equipped with a pneumatic valve system. Through the automatic control of the operating system, the user can perform operations such as one-button vacuum pumping, non-stop take out and place sample, and complete shutdown from the touch screen. The equipment is equipped with four sets of tungsten boat evaporation sources and water-cooled copper electrode. Each evaporation source supports a large current of 100A and a heating temperature of 1800℃. It can realize multi-layer coating or mixed coating of multiple materials. Technical parameters: 1. Sample stage Size Maximum support φ150mm samples Height Adjustable up and down 140mm 2. Evaporation source Quantity Tungsten Boat x4 3. Vacuum chamber Chamber size φ325mm x 510mm Observation window Front φ100mm with shading plate Chamber material 304 stainless steel Open method Front door opening 4. Film thickness control Crystal oscillator type film thickness measuring instrument, optional multi-channel film thickness controller 5. Vacuum system Backing pump Two stage rotary vane pump Pumping port KF16 Secondary pump Turbomolecular pump Pumping port CF160 Vacuum measurement Resistance + ionization Compound vacuum gauge Exhaust rate Mechanical pump 1.1L/s Ultimate vacuum 1.0E-5Pa Power supply Molecular pump 600L/s 6. Control system PLC automatic control 7. Operation interface: touch screen + operation panel 8. Others Supply voltage AC220V,50Hz Overall size 1000mm x 800mm x 1500mm Total power 10kW Total Weight 350kg

Minimum Order: 1 bags

Four source high vacuum evaporation coating equipment Model: CY-EVP325S-4S-T This equipment is a four-source high-vacuum evaporation coater. The equipment adopts a front-opening door vacuum chamber design. In addition, the chamber is increased to 500mm. The distance between the sample stage and the evaporation source has a larger adjustment range, which can adapt to various evaporation needs. It avoids the sample being damaged by the high temperature of the evaporation source. The chamber adopts an top sample stage, the sample stage can be rotated, heated and lifted, and all operations can be integrated and controlled through the touch screen. The equipment vacuum system is a two-stage vacuum system composed of a two- stage rotary vane pump and a turbo molecular pump, which can provide a clean and oil-free high vacuum environment. The equipment is equipped with a pneumatic valve system. Through the automatic control of the operating system, the user can perform operations such as one-button vacuum pumping, non-stop take out and place sample, and complete shutdown from the touch screen. The equipment is equipped with four sets of tungsten boat evaporation sources and water-cooled copper electrode. Each evaporation source supports a large current of 100A and a heating temperature of 1800℃. It can realize multi-layer coating or mixed coating of multiple materials. Technical parameters: 1. Sample stage Size Maximum support φ150mm samples Height Adjustable up and down 140mm 2. Evaporation source Quantity Tungsten Boat x4 3. Vacuum chamber Chamber size φ325mm x 510mm Observation window Front φ100mm with shading plate Chamber material 304 stainless steel Open method Front door opening 4. Film thickness control Crystal oscillator type film thickness measuring instrument, optional multi-channel film thickness controller 5. Vacuum system Backing pump Two stage rotary vane pump Pumping port KF16 Secondary pump Turbomolecular pump Pumping port CF160 Vacuum measurement Resistance + ionization Compound vacuum gauge Exhaust rate Mechanical pump 1.1L/s Ultimate vacuum 1.0E-5Pa Power supply Molecular pump 600L/s 6. Control system PLC automatic control 7. Operation interface: touch screen + operation panel 8. Others Supply voltage AC220V,50Hz Overall size 1000mm x 800mm x 1500mm Total power 10kW Total Weight 350kg

Minimum Order: 1 bags

Desktop dual-source thermal evaporation coating machine CY-EVP180G-2S-LV is a vacuum thermal evaporative deposition coating machine. During the evaporation coating process of the sample, the sample stage can be rotated to obtain a more uniform film. The coating current can reach up to 60A. The equipment is equipped with two sets of evaporation sources, which can be switched through the baffle to achieve multi-layer coating of samples. The machine is small in size, which can effectively save laboratory space; it is simple to operate and has strong adaptability to different materials, making it very suitable for laboratory purchases. It has a wide range of applications and can prepare various metal thin films and some non-metal thin films, so it is widely used in the preparation of electrodes and organic light-emitting LEDs. Features: 1. The sample table can be rotated, and the coating effect can be more uniform; 2. Using tungsten wire basket as heating source, the highest temperature can reach 1700℃; 3. Inert gas can be introduced into the vacuum cavity to clean the cavity, or reactive gas can be introduced to perform reactive evaporation coating. 4. The air inlet is equipped with a needle valve to adjust the air flow. 5. Double evaporation method source can realize multi-layer coating. Technical parameter 1. Model CY-EVP180G-2S-LV (2 Source) 2. Power supply AC220V，60Hz 3. Max power 1200W 4. Evaporation sources Tungsten wire basket 2-set 5. Sample table Diameter φ65mm； 6. Rotation speed 0-20rpm； 7. Height:The distance between the evaporation source is adjustable, the adjustment range is 60mm-100mm 8. Vacuum chamber Material:high purity quartz φ180mm x 210mm 9. Max temp 1700℃,Thermocouple B type 10. Vacuum gauge resistance-type vacuum gauge 11. Vacuum interface KF40 12. Inlet interface 1/4NPS 13. Overall Dimensions 500x350x400mm

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Introduction CY-EVP180S-2S-HV is a high-vacuum evaporation coater with two sources, tungsten filament basket (or tungsten boat) is used as the evaporation source, and distance between sample table and evaporation source is adjustable. The instrument can stably evaporate metals and some organics. High-vacuum stainless steel chamber is adopted, which has good sealing performance and excellent vacuum performance. The chamber is equipped with an observation window, so the coating process is visible. Ultimate vacuum 10E-5Pa with molecular pump system, effectively improve the coating quality, and can meet the vacuum environment required for most evaporation coating experiments. Technical parameters 1. Input power AC 220V, single phase, 50Hz 2. Evaporation current 100A 3. Electrode voltage 10V 4. Evaporation source Quantity: 2 Tungsten filament basket ×2 pcs, tungsten boat ×2 pcs Evaporator baffle Yes 5. Sample holder Top setting Diameter: φ65 mm Rotating speed: 0-20 rpm The distance between sample holder and evaporation source is adjustable 6. Vacuum chamber Inner wall processing: electrolytic polishing Chamber dimension: ~φ180mm×H210mm Chamber material: 304 stainless steel Opening mode: top open 7. Temperature measurement B type thermocouple 8. Display screen 7-inch touch screen 9. Current regulation Touch screen setting, range 0~100A 10. Vacuum required Rotary vane pump or molecular pump group can be selected as required. (additional charge) Extraction interface KF25 11. Inlet interface Diameter 6mm round hole fine tuning valve 12. Thin film thickness gauge Accuracy: 0.1Ã Measurement speed: 100mS-1S adjustable Measurement range: 500 000Ã (Aluminum) Standard sensor crystal: 6MHz

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Multi-arc ion plating is the use of gas discharge or partial ionization of evaporated substances, while gas ions or particles of evaporated substances are bombarded, the evaporated substances or reactants are deposited on the substrate. Ion plating combines the glow discharge, plasma technology and vacuum evaporation organically, which not only significantly improves the film quality, but also expands the application range of the film. It has the advantages of fast evaporation rate, strong film adhesion, good diffraction, and extensive film materials. It is very suitable for plating hard protective film such as TiN. At the same time, because it can change the color of the film by controlling the atmosphere, and the film is firmly combined with the substrate, it can also be used to make decorative films of various colors Features This equipment is equipped with two multi-arc targets, which are placed on both sides of the chamber. Cooperating with the planetary sample stage can effectively improve the coating efficiency and improve the effect. The coating instrument also adopts an integrated design, the chamber and the electric control part are separated on the left and right, which realizes the separation of water and electricity, and effectively guarantees the safety of users. Technical parameter 1. Model CY-MIOP500S-2TA 2. Vacuum chamber Water cooled stainless steel chamber; φ500mm X 490mmH; Front door type, φ 100 mm quartz observation window; Built in two sets of infrared heating lamps, can be used for baking and degassing the chamber; Multiple CF interfaces are reserved for installation of multi-channel film thickness meter 3. Gas system Mass flow meter:Ar gas 0~200sccm，N2 gas 0~200sccm other flow or gas can be customized 4. Power supply AC 220V;50Hz;10kW 5. Control system 15“ touch screen configuration control software 6. Multi arc target Quantity and SPEC 2-set;3inches Installation method Chamber side, opposite Working current 0~150A Target thickness 50mm,min 20mm 7. Sample stage Specification Planetary hanger Number of samples There are 6 hanging points on each hanger, totally 6 hangers Rotation speed Revolution speed 1~20rpm 8. Vacuum system Model CY-GZK103-A Molecular pump Turbo molecular pump Backing pump Double stage rotary vane pump Pumping molecular pump：6000L/S Comprehensive pumping performance: 30 minutes vacuumdegree up to: 5×10E-3Pa Rotary vane pump：1.1L/S Ultimate vacuum 5×10E-4Pa Extraction interface KF40 Exhaust interface KF16 vacuum measurement composite vacuum gauge

Minimum Order: 1 bags

desktop double target DC magnetron sputter coating machine This equipment is a double target magnetron sputter coating machine, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc. it can also be used to prepare SEM samples in laboratory. It adopts high vacuum stainless steel chamber, front door opening design, and quartz observation window on the door, which is convenient for the observation and recording of the experiment. At the same time, the equipment is equipped with a rotary heating sample table, which can effectively improve the film uniformity and film quality. A set of baffle plate is installed on the top cover, and the two targets can be switched by rotating the baffle plate to realize multilayer coating. This equipment needs to be used together with high vacuum molecular pump group. Users can choose imported brand small molecular pump to further save installation area. At the same time, the model can be equipped with film thickness meter components, which can monitor the film thickness in real time and provide reliable parameters for the experimental process. Technical parameter 1. Sample stage Size 100mm Heating ≤500℃ Rotation speed 1-20r/min Temp control ±1℃ 2. Magnetron sputter head Quantity 2” x2 Cooling mode Water cooled 3. Vacuum chamber Size Dia 210mm× 260mm Watch window φ40mm Material SUS Open mode Front opening 4. Sputter power supply DC power supply 1 set Output power ≤300W Output voltage ≤600V response time ＜5ms 5. Water cooling Tank capacity 9L Flow 10 L/min 6. Film thickness gauge Accuracy 0.1angstrom Cooling mode Water cooling 7.Molecular pump system Backing pump Rotary vane pump Pumping 1.1L/s Secondary pump turbo molecular pump（domestic） Pumping 600L/s Extraction interface KF40 Air outlet KF16 8.Other Power supply AC220V,50Hz Total power 4kw

Minimum Order: 1 bags

Dual target DC RF magnetron sputtering coating machine---bottom target type CY-MSP500S-DCRF-B is a special laboratory coating machine with two targets developed by our company. It is equipped with a DC power supply and a RF power supply. It can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Features a.Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise; b.The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time; c.This model adopts the layout of under target, the sample table is on the top, and the height with the target surface can be precisely adjusted by program, and can be rotated and heated, with excellent performance. Technical parameter 1. Model CY-MSP500S-DCRF-B 2. Input AC220V，50Hz 3. Total power 6KW 4. Ultimate vacuum degree 5x10-4Pa 5. Sample table parameters Size 150 Dia. Height 70 mm adjustable Heating ≤500℃ Rotation speed 1-20 rpm 6. Magnetron sputtering head parameters Quantity 2-set，2-inch Cooling mode Water cooled，required flow rate10L/min Water chiller 10L/min circulating water cooling 7. Vacuum chamber Size 500mmDia. × 490mm H Material Stainless steel Watch window 100mm Dia. Open mode front opening door 8. Gas flow controller 1channel 200sccm Ar； 9. Vacuum pump Molecular pump system pumping,600L/S 10. Film thickness gauge Quartz vibrating film thickness gauge ， one set，Resolution 0.10 Å 11. Sputter power supply DC power supply：one set，500W，for metal films RF power supply：one set，500W，for non-metallic films 12. Operating mode All-in-one computer operation 13. Overall dimensions 1090mm X 900mm X 1250mm 14. Total weight 350kg

Minimum Order: 1 bags

Dual target magnetron sputtering machine with reciprocating sample stage CY-MSP500S-DCRF-RE is a laboratory-specific magnetron sputtering coater with two target positions developed by our company. The equipment is equipped with a DC power supply and a radio frequency power supply, which can be used to prepare single or multilayer iron Electrical film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc. Features a.Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and speed, high coating rate, low sample temperature rise, and is a typical high-speed low-temperature sputtering. b.The magnetron sputter target is equipped with a water-cooled interlayer. The water-cooled machine can effectively take away the heat and avoid the heat accumulation on the target surface, so that the magnetron sputter can work stably for a long time. c.The sample stage adopts a reciprocating design, and the left side is equipped with a magnetic coupling push rod, which can push the sample stage left and right. d.The whole machine adopts touch screen control, built-in one-button coating program, easy to operate, it is an ideal equipment for laboratory preparation of films Technical parameter 1. Model CY-MSP500S-DCRF-RE 2. Input AC220V，50Hz 3. Total power 6KW 4. Ultimate vacuum degree 5x10-4Pa 5. Sample table parameters Size 100mm x 100mm Reciprocating stroke 200mm 6. Magnetron sputtering head parameters Quantity 2-set，2-inch Cooling mode Water cooled，required flow rate10L/min Water chiller 10L/min circulating water cooling 7.Vacuum chamber Size φ500mm X 490mm H Material Stainless steel Watch window φ100mm Open mode front opening door 8. Gas flow controller 1channel 200sccm Ar； 9. Vacuum pump Molecular pump system pumping600L/S 10. Film thickness gauge Quartz vibrating film thickness gauge ，one set， Resolution 0.10 Å 11. Sputter power supply DC power supply：one set，500W，for preparing metal films RF power supply：one set，500W，for non - metallic coating 12. Operating mode All-in-one computer operation 13. Overall dimensions 1090mm X 900mm X 1250mm 14. Total weight 350kg

Minimum Order: 1 bags

three target rf magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. Technical parameter 1. Power supply AC220V，50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:3 Size:2” Cooling mode Water cooled，flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar； 7. Vacuum pump:A molecular pump system，pumping 600L/S 8.Quartz vibrating film thickness gauge One set， resolution 0.10 angstrom 9. Sputter power source RF power supply500W-1000W，Suitable for non - metallic films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg

Minimum Order: 1 bags