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Name Automatic diamond wire cutting machine Model CY-DWC300-A Features 1. The cutting size can reach 12". (max) 2. The main motor drives the diamond cutting line to move downward at a constant speed, and the material is fixed on the worktable to ensure stable cutting. 3. The worktable can be adjusted by 360° rotation manually or through program control. 4. The pneumatic tensioning system is adopted and imported pneumatic components are used to make the tensioning force more stable and reliable. 5. PLC program control system and large-size touch screen make the operation simple and quick. 6. Various tooling fixtures can be designed according to your needs. Functions 1.Ceramic materials: alumina ceramics, zinc oxide ceramics, zirconia ceramics, target ceramics, honeycomb ceramics, semiconductor ceramics, conductive ceramics, non-conductive ceramics, etc; 2. Crystal material: graphite, silicon crystal (solar polysilicon, monocrystalline silicon), sapphire, alumina crystal, infrared glass crystal, alumina crystal, silicon carbide crystal, cesium iodide crystal, etc.; 3. Glass materials: chalcogenide glass, optical glass, quartz glass, infrared glass, glass tube, etc.; 4. Metal materials: iron, aluminum, copper, titanium alloy, magnesium alloy and other metals and alloys, non-ferrous metals (zinc sulfide, ferrite), etc.; 5. Composite materials: PVC board, carbon fiber composite material, glass fiber composite material, etc. 6. Rock materials: precise sections of natural rocks, jade, meteorite, Peicui, agate and other high-value materials; geological optical slices, geological thin sections (sedimentary rocks, magmatic rocks, metamorphic rocks, ores), etc.. 7. Thermoelectric materials: bismuth telluride, lead telluride, silicon germanium alloy, etc. 8. Infrared optical materials: zinc selenide, zinc sulfide, silicon, germanium and other crystals 9. Biomedical materials:Bioplasticization specimen sections (human animal organs, jaw joint sections of soft and hard tissues, implant observation, tooth crown and bridge, teeth and other histological specimens);Combined sections of soft and hard tissues in orthopedics department (fresh tissues and hard tissues such as femur, hip joint and vertebral body, bone histological samples with implants, etc.); Cardiac and cerebrovascular stent section, stone section and other medical tissue sections;; Parameters 1. Power supply: 220 V 50 Hz; 2. Power: < 550W (max); 3. Spindle motor: AC frequency conversion motor, Power 400W; 4. Y, Z, R axis motor: precision stepping motor; 5. Cutting wire speed: 0-8m / s adjustable, digital display; 6. Total length of cutting line: ≤ 150m; 7. Cutting line diameter: ≤ 0.45mm; 8. Y axis travel: ≤ 300 mm, digital display; 9. Z axis travel: ≤ 300 mm, digital display; 10. Y, Z axis feed indication accuracy: 0.01mm; 11. Worktable angle: 0-360°, resolution 0.01°, digital display; 12. Repeated positioning accuracy of worktable: < 0.032° 13. Cutting sample size: Ø 300 mm × 300 mm (max); 14. Tension system: pneumatic tension, tension pressure adjustment range 0-1mpa; 15. Safety control device: self stop and emergency stop switch of line break SPEC Size ：1000mm×900mm×1700mm； Weight About 500kg Standard accessory Tension pulley 2 pieces Guide wheel 2 pieces Diamond wire 2 rolls Water pump 1 set Resin ceramic block 2 pieces Paraffin wax stick 4 pieces Optional accessory 1. Diamond wire (Ø 0.125mm, Ø 0.25mm, Ø 0.35mm, Ø 0.42mm) 2. Cutting oil 3. STX-1200-YB wire cutting machine swing mechanism (especially suitable for cutting high-hardness materials, such as gems, jade, etc., or low-hardness graphite, KDP, etc.) 4. STX-1200-A axis swing rotating mechanism (especially suitable for cutting high hardness materials, such as jade, etc.) 5.CYKY series heating platform 6. Silent oil free air compressor 7. DX-100 single crystal orientation instrument

Minimum Order: 1 bags

Name Automatic diamond wire cutting machine Model CY-DWC300-A Features 1. The cutting size can reach 12". (max) 2. The main motor drives the diamond cutting line to move downward at a constant speed, and the material is fixed on the worktable to ensure stable cutting. 3. The worktable can be adjusted by 360° rotation manually or through program control. 4. The pneumatic tensioning system is adopted and imported pneumatic components are used to make the tensioning force more stable and reliable. 5. PLC program control system and large-size touch screen make the operation simple and quick. 6. Various tooling fixtures can be designed according to your needs. Functions 1.Ceramic materials: alumina ceramics, zinc oxide ceramics, zirconia ceramics, target ceramics, honeycomb ceramics, semiconductor ceramics, conductive ceramics, non-conductive ceramics, etc; 2. Crystal material: graphite, silicon crystal (solar polysilicon, monocrystalline silicon), sapphire, alumina crystal, infrared glass crystal, alumina crystal, silicon carbide crystal, cesium iodide crystal, etc.; 3. Glass materials: chalcogenide glass, optical glass, quartz glass, infrared glass, glass tube, etc.; 4. Metal materials: iron, aluminum, copper, titanium alloy, magnesium alloy and other metals and alloys, non-ferrous metals (zinc sulfide, ferrite), etc.; 5. Composite materials: PVC board, carbon fiber composite material, glass fiber composite material, etc. 6. Rock materials: precise sections of natural rocks, jade, meteorite, Peicui, agate and other high-value materials; geological optical slices, geological thin sections (sedimentary rocks, magmatic rocks, metamorphic rocks, ores), etc.. 7. Thermoelectric materials: bismuth telluride, lead telluride, silicon germanium alloy, etc. 8. Infrared optical materials: zinc selenide, zinc sulfide, silicon, germanium and other crystals 9. Biomedical materials:Bioplasticization specimen sections (human animal organs, jaw joint sections of soft and hard tissues, implant observation, tooth crown and bridge, teeth and other histological specimens);Combined sections of soft and hard tissues in orthopedics department (fresh tissues and hard tissues such as femur, hip joint and vertebral body, bone histological samples with implants, etc.); Cardiac and cerebrovascular stent section, stone section and other medical tissue sections;; Parameters 1. Power supply: 220 V 50 Hz; 2. Power: < 550W (max); 3. Spindle motor: AC frequency conversion motor, Power 400W; 4. Y, Z, R axis motor: precision stepping motor; 5. Cutting wire speed: 0-8m / s adjustable, digital display; 6. Total length of cutting line: ≤ 150m; 7. Cutting line diameter: ≤ 0.45mm; 8. Y axis travel: ≤ 300 mm, digital display; 9. Z axis travel: ≤ 300 mm, digital display; 10. Y, Z axis feed indication accuracy: 0.01mm; 11. Worktable angle: 0-360°, resolution 0.01°, digital display; 12. Repeated positioning accuracy of worktable: < 0.032° 13. Cutting sample size: Ø 300 mm × 300 mm (max); 14. Tension system: pneumatic tension, tension pressure adjustment range 0-1mpa; 15. Safety control device: self stop and emergency stop switch of line break SPEC Size ：1000mm×900mm×1700mm； Weight About 500kg Standard accessory Tension pulley 2 pieces Guide wheel 2 pieces Diamond wire 2 rolls Water pump 1 set Resin ceramic block 2 pieces Paraffin wax stick 4 pieces Optional accessory 1. Diamond wire (Ø 0.125mm, Ø 0.25mm, Ø 0.35mm, Ø 0.42mm) 2. Cutting oil 3. STX-1200-YB wire cutting machine swing mechanism (especially suitable for cutting high-hardness materials, such as gems, jade, etc., or low-hardness graphite, KDP, etc.) 4. STX-1200-A axis swing rotating mechanism (especially suitable for cutting high hardness materials, such as jade, etc.) 5.CYKY series heating platform 6. Silent oil free air compressor 7. DX-100 single crystal orientation instrument

Minimum Order: 1 bags

Metallographic sample cutting machine CY-5000B is suitable for precise non- deformation cutting of metals, electronic components, ceramic materials, crystals, cemented carbide, rock samples, mineral samples, concrete, organic materials, biological materials (tooth, bone) and other materials . The equipment has high positioning accuracy; wide speed range; strong cutting ability; strong circulating cooling system; preset feed speed; touch screen control display, easy to operate and control; automatic cutting can reduce operator fatigue and ensure the consistency of sample making; large and bright cutting room with safety switch. It is an ideal equipment for industrial and mining enterprises and scientific research institutes to prepare high-quality samples. 1. Spindle speed: the user can arbitrarily set between 500-5000r to adapt to material cutting, and the setting is effective when stepless speed regulation is running. 2. Cutting stroke: range 0-200mm, set an appropriate stroke to stop cutting when cutting is completed, continuous cutting of the same sample does not need to reposition. 3. Cutting speed: range 0.01-3mm/s, select the cutting speed suitable for the material to meet the material cutting requirements, and the setting is invalid during operation. 4. Retreat speed: range 0-15mm/s, which refers to the speed of retreating to the starting point of cutting when the cutting runs to the set distance. The larger the setting distance, the faster when returning. 5. Jog speed: range 0-15mm/s, which refers to the manual forward and backward speed. If you are not familiar with the operation of the equipment, you should set smaller jog speed to avoid the cutting piece from hitting the workpiece. 6. Cutting mode selection: direct cutting and impact cutting are two modes for users to choose, which can meet the cutting of materials in a wider range 7. Direct cutting: It is the common and most economical cutting mode, suitable for cutting most materials. , 8. Impact cutting: It is suitable for a certain specific material and material with high hardness that can not find a suitable cutting blade, and the worn material is easy to block the cutting blade, or the abrasive of the cutting blade is insufficient, impact cutting may result in a higher cutting blade Wear, but will reduce the risk of overheating the workpiece. 9. Cutting distance: range 0.1-2mm, only effective for impact cutting mode, the smaller the set distance, the faster the impact cutting speed, and the cutting speed of the workpiece is related to the set cutting speed. Main technical parameters: Cutting disc Standard φ200xφ32x0.9 Spindle speed 500-5000r/min Feed rate 0.01-3mm/s Manual feed speed 0-15mm/s Retreat speed 0-15mm/s Impact cutting distance 0.1-2mm Cutting stroke (Y axis) 200mm Max. cutting diameter φ60mm Max. clamping length of worktable 150mm Max. clamping width of worktable 200mm Servo motor Power: 1.1kw Use method data Can store 12 types Power supply: AC220V 50HZ Dimensions 750×860×430mm Weight 126KG

Minimum Order: 1 bags

Digital Low Speed Diamond Saw with Three 4" Precision Blades & Complete Accessories - CY-SYJ-150 CY-SYJ-150 is CE certified low-speed diamond cutting machine, which equips with the advanced digital micrometer and digital speed display controller, it is the perfect tool for cutting/dicing/slicing all kinds of materials up to 32.5 mm thickness, especially for brittle crystals, ceramics, TEM samples, and even plastic samples. Also this cutting machine can be used for cutting cylindrical cell for failure analysis Technical parameter of cutting machine 1. Model No. SYJ-150 2. Working voltage AAC 110V/220V switchable for worldwide usage 110VDC Motor 8Amp fuse installed 3. Speed range 0~600rpm with LED Digital display 4. Cutting width&Depth The cutting width of the slice is controllable from 1mm ~ 24mm by adjusting the LCD digital micrometer. The LCD micrometer is waterproof with a resolution of 0.001 mm and accuracy of +/-0.003 mm. 32.5mm max. cutting depth (when using 35mm Dia. blade flange) 5. Diamond blades Three blades are included for cutting various materials SiC blade: 4" x 0.35 mm x 0.5" Arbor for cutting nonferrous metal materials, such as superalloys. Al2O3 blade: 4" x 0.35 mm x 0.5" Arbor for cutting ferrous metal materials, such as iron and steel. Full sintered diamond blade: 4" x 0.35 mm x 0.5" arbor for cutting crystal, ceramic, and plastic materials 6. Sample Holder & Mini-vise Two angles adjustable sample holder is included, please click picture below for the details (max. opening 26mm) One Mini-vise is included, which can be easily adapted onto the sample holder to clamp rod shape specimens with a diameter up to 1'' max. 7. Package Dimensions 19"(L) x 15"(W) x 15"(H)   8. Shipping Weight & Dimension 32 lbs, 18" x 14" x 14" 9. Certification CE Certified.NRTL or CSA certificatin is available  upon request

Minimum Order: 1 bags

Digital Low Speed Diamond Saw with Three 4" Precision Blades & Complete Accessories - CY-SYJ-150 CY-SYJ-150 is CE certified low-speed diamond cutting machine, which equips with the advanced digital micrometer and digital speed display controller, it is the perfect tool for cutting/dicing/slicing all kinds of materials up to 32.5 mm thickness, especially for brittle crystals, ceramics, TEM samples, and even plastic samples. Also this cutting machine can be used for cutting cylindrical cell for failure analysis Technical parameter of cutting machine 1. Model No. SYJ-150 2. Working voltage AAC 110V/220V switchable for worldwide usage 110VDC Motor 8Amp fuse installed 3. Speed range 0~600rpm with LED Digital display 4. Cutting width&Depth The cutting width of the slice is controllable from 1mm ~ 24mm by adjusting the LCD digital micrometer. The LCD micrometer is waterproof with a resolution of 0.001 mm and accuracy of +/-0.003 mm. 32.5mm max. cutting depth (when using 35mm Dia. blade flange) 5. Diamond blades Three blades are included for cutting various materials SiC blade: 4" x 0.35 mm x 0.5" Arbor for cutting nonferrous metal materials, such as superalloys. Al2O3 blade: 4" x 0.35 mm x 0.5" Arbor for cutting ferrous metal materials, such as iron and steel. Full sintered diamond blade: 4" x 0.35 mm x 0.5" arbor for cutting crystal, ceramic, and plastic materials 6. Sample Holder & Mini-vise Two angles adjustable sample holder is included, please click picture below for the details (max. opening 26mm) One Mini-vise is included, which can be easily adapted onto the sample holder to clamp rod shape specimens with a diameter up to 1'' max. 7. Package Dimensions 19"(L) x 15"(W) x 15"(H)   8. Shipping Weight & Dimension 32 lbs, 18" x 14" x 14" 9. Certification CE Certified.NRTL or CSA certificatin is available  upon request

Minimum Order: 1 bags

15L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned.The device is equipped with a mechanical vacuum pump, while vacuuming maintains the vacuum of the chamber, the pollutants after the plasma reaction can also be pumped away by the vacuum pump; therefore, the short- time cleaning can completely clean the organic pollutants. In addition to the cleaning function, this small plasma cleaner can change the surface properties of some materials according to the needs under certain conditions. During the cleaning process, the glow discharge of the small plasma cleaner not only enhances the adhesion, compatibility and wettability of these materials, but also disinfects and sterilizes the materials. Applications: Small plasma cleaners are widely used in the fields of optics, optoelectronics, electronics, materials science, life sciences, polymer science, biomedicine, and microfluidics. Technical parameter 1. Cleaning the chamber Chamber material Stainless steel Chamber size 220mm*220mm*310mm 2.RF power supply Power supply features The power supply is an all-solid-state RF power supply, and adopts a high-stability and high-reliability power amplifier module and a DC module, which effectively ensures the RF power output of the power supply. High quality electronic components are used to ensure the reliability of the products. Power advantage ● Long time normal operation ● Simple and flexible operation ● High power supply efficiency and low heat generation ●With perfect reflection power protection function RF power 0~300W continuously adjustable，auto-match Signal frequency 13.56MHz ±0.005% Reflected power ≤100W Power stability ±0.1% RF connector N type connector Machine efficiency ≥75% Harmonic component ≤-50 dBc Cooling method Forced air cooling 3.Gas measurement Measuring unit Float flowmeter Gas channel Two channels(O2 和Ar) Vacuum Vacuum measurement Digital vacuum gauge (resistance gauge) Vacuum pump Two-stage rotary vane vacuum pump VRD-4 Motor speed 50 Hz: 1440; 60 Hz: 1720 Pumping rate 50 Hz: 1.1L/s; 60 Hz: 1.3L/s Vacuum range 0.1Pa～10000Pa Ultimate vacuum 0.5Pa Motor noise ≤56dB Pipe interface Gas inlet: KF16; exhaust port KF16. Connecting pipe KF16 vacuum bellows Vacuum valve KF16 ball valve Motor Power 400W 4.Others Power supply AC220V 50Hz Total power 800W Operating temperature -10℃-- 40℃ Working vacuum ≤40Pa Overall size 650mm×650mm×550mm

Minimum Order: 1 bags

5L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned.The device is equipped with a mechanical vacuum pump, while vacuuming maintains the vacuum of the chamber, the pollutants after the plasma reaction can also be pumped away by the vacuum pump; therefore, the short- time cleaning can completely clean the organic pollutants. In addition to the cleaning function, this small plasma cleaner can change the surface properties of some materials according to the needs under certain conditions. During the cleaning process, the glow discharge of the small plasma cleaner not only enhances the adhesion, compatibility and wettability of these materials, but also disinfects and sterilizes the materials. Applications: Small plasma cleaners are widely used in the fields of optics, optoelectronics, electronics, materials science, life sciences, polymer science, biomedicine, and microfluidics. Technical parameters: 1. Cleaning chamber Chamber material High purity quartz Chamber size Diameter 200 mm; Length 170 mm 2. RF power supply Power supply features:The power supply is an all-solid-state RF power supply, and adopts a high-stability and high-reliability power amplifier module and a DC module, which effectively ensures the RF power output of the power supply. High quality electronic components are used to ensure the reliability of the products. Power advantage ● Long time normal operation ● Simple and flexible operation ● High power supply efficiency and low heat generation ●With perfect reflection power protection function RF power 0~100W continuously adjustable / 0~150W   continuously adjustable Signal frequency 13.56MHz   ±0.005% Reflected power ≤100W Power stability ±0.1% RF connector N type connector Machine efficiency ≥75% Harmonic component ≤-50 dBc cooling method Forced air cooling 3.Gas measurement Measuring unit Float flowmeter Gas channel Two channels A channel range 10～100ml B channel range 16～160ml 4.Vacuum system Vacuum measurement Digital vacuum gauge (resistance gauge) Vacuum pump Two-stage rotary vane vacuum pump Motor speed 50 Hz: 1440; 60 Hz: 1720 Pumping rate 50 Hz: 1.1L/s; 60 Hz: 1.3L/s Vacuum range 0.1Pa～10000Pa Ultimate vacuum 0.5Pa Motor noise ≤56dB Pipe interface Gas inlet: KF16; exhaust port KF16. Connecting pipe KF16 vacuum bellows Vacuum valve Solenoid valve Motor Power 400W 5.Others Power supply AC220V 50/60Hz Total power 1000W/1500W Operating temperature -10℃-40℃ Working vacuum ≤40Pa Overall size 600mm×650mm×730mm Total Weight 80kg (including packaging)

Minimum Order: 1 bags

10L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned.The device is equipped with a mechanical vacuum pump, while vacuuming maintains the vacuum of the chamber, the pollutants after the plasma reaction can also be pumped away by the vacuum pump; therefore, the short- time cleaning can completely clean the organic pollutants. In addition to the cleaning function, this small plasma cleaner can change the surface properties of some materials according to the needs under certain conditions. During the cleaning process, the glow discharge of the small plasma cleaner not only enhances the adhesion, compatibility and wettability of these materials, but also disinfects and sterilizes the materials. Applications: Small plasma cleaners are widely used in the fields of optics, optoelectronics, electronics, materials science, life sciences, polymer science, biomedicine, and microfluidics. Technical parameters: 1. Cleaning chamber Chamber material High purity quartz Chamber size Diameter 200 mm; Length 340 mm 2. RF power supply Power supply features:The power supply is an all-solid-state RF power supply, and adopts a high-stability and high-reliability power amplifier module and a DC module, which effectively ensures the RF power output of the power supply. High quality electronic components are used to ensure the reliability of the products. Power advantage ● Long time normal operation ● Simple and flexible operation ● High power supply efficiency and low heat generation ●With perfect reflection power protection function RF power 0~100W continuously adjustable / 0~150W   continuously adjustable Signal frequency 13.56MHz   ±0.005% Reflected power ≤100W Power stability ±0.1% RF connector N type connector Machine efficiency ≥75% Harmonic component ≤-50 dBc cooling method Forced air cooling 3.Gas measurement Measuring unit Float flowmeter Gas channel Two channels A channel range 10～100ml B channel range 16～160ml 4.Vacuum system Vacuum measurement Digital vacuum gauge (resistance gauge) Vacuum pump Two-stage rotary vane vacuum pump Motor speed 50 Hz: 1440; 60 Hz: 1720 Pumping rate 50 Hz: 1.1L/s; 60 Hz: 1.3L/s Vacuum range 0.1Pa～10000Pa Ultimate vacuum 0.5Pa Motor noise ≤56dB Pipe interface Gas inlet: KF16; exhaust port KF16. Connecting pipe KF16 vacuum bellows Vacuum valve Solenoid valve Motor Power 400W 5.Others Power supply AC220V 50/60Hz Total power 1000W/1500W Operating temperature -10℃-40℃ Working vacuum ≤40Pa Overall size 600mm×650mm×730mm Total Weight 80kg (including packaging)

Minimum Order: 1 bags

2L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned.The device is equipped with a mechanical vacuum pump, while vacuuming maintains the vacuum of the chamber, the pollutants after the plasma reaction can also be pumped away by the vacuum pump; therefore, the short- time cleaning can completely clean the organic pollutants. In addition to the cleaning function, this small plasma cleaner can change the surface properties of some materials according to the needs under certain conditions. During the cleaning process, the glow discharge of the small plasma cleaner not only enhances the adhesion, compatibility and wettability of these materials, but also disinfects and sterilizes the materials. Applications: Small plasma cleaners are widely used in the fields of optics, optoelectronics, electronics, materials science, life sciences, polymer science, biomedicine, and microfluidics. Technical parameters: 1. Cleaning chamber Chamber material High purity quartz Chamber size Diameter 100 mm; Length 270 mm 2. RF power supply Power supply features:The power supply is an all-solid-state RF power supply, and adopts a high-stability and high-reliability power amplifier module and a DC module, which effectively ensures the RF power output of the power supply. High quality electronic components are used to ensure the reliability of the products. Power advantage ● Long time normal operation ● Simple and flexible operation ● High power supply efficiency and low heat generation ●With perfect reflection power protection function RF power 0~100W continuously adjustable / 0~150W   continuously adjustable Signal frequency 13.56MHz   ±0.005% Reflected power ≤100W Power stability ±0.1% RF connector N type connector Machine efficiency ≥75% Harmonic component ≤-50 dBc cooling method Forced air cooling 3.Gas measurement Measuring unit Float flowmeter Gas channel Two channels A channel range 10～100ml B channel range 16～160ml 4.Vacuum system Vacuum measurement Digital vacuum gauge (resistance gauge) Vacuum pump Two-stage rotary vane vacuum pump Motor speed 50 Hz: 1440; 60 Hz: 1720 Pumping rate 50 Hz: 1.1L/s; 60 Hz: 1.3L/s Vacuum range 0.1Pa～10000Pa Ultimate vacuum 0.5Pa Motor noise ≤56dB Pipe interface Gas inlet: KF16; exhaust port KF16. Connecting pipe KF16 vacuum bellows Vacuum valve Solenoid valve Motor Power 400W 5.Others Power supply AC220V 50/60Hz Total power 550W/600W Operating temperature -10℃-40℃ Working vacuum ≤40Pa Overall size 540mm×500mm×440mm Total Weight 58kg (including packaging)

Minimum Order: 1 bags

Wafer level large-size molybdenum disulfide preparation device This equipment is a wafer level large-size molybdenum disulfide preparation device designed based on CVD principles. It includes a three-zone tube furnace, a specially designed furnace tube and a set of supporting gas circuits. The equipment can uniformly release the reaction gas into the furnace tube through a specially designed pipeline to ensure the consistency and uniformity of the product on the back-end wafer. It is the best choice for molybdenum disulfide preparation experiments. Technical parameters: 1. Product model CY-O1200-120III-IC-3Z-MoS2 2. Furnace tube material High purity quartz 3. Furnace tube size External large quartz tube φ120mm x1000mm 4. Internal small quartz tube φ25mm x820mm x7 5. Temperature zone length Three heating zone 200mm+200mm+200mm 6. Temperature control accuracy ±1℃ 7. Temperature curve Independent temperature control in three temperature zones, each temperature zone can be set with 30-segment time temperature curve 8. Operating temperature 0~1150℃ 9. Heating rate ≤10℃/min 10. Intake system:Three-channel mass flow meter:Ar gas 0~500sccm,N2 gas 0~200sccm,H2 gas 0~200sccm Equipped with seven channels of gas separation, gas mixing gas path. 11. Furnace pipe flange Stainless steel water-cooled flange, equipped with KF16 vacuum interface, mechanical vacuum gauge and stainless steel needle valve 12. Power requirements AC 220V 50Hz 4kW 13. Control mode 7-inch touch screen 14. Vacuum pump Dual stage rotary vane vacuum pump 15. Vacuum Theoretical ultimate vacuum degree 10^-1Pa

Minimum Order: 1 bags

This set CVD equipment is a miniaturized CVD system, the core of which is a mini tube furnace, which uses resistance wire heating, and the maximum temperature of the equipment can reach 1200°C. The instrument also contains a three-channel float flow meter and a molecular pump set, which respectively constitute the inlet and outlet gas parts of the CVD. There is a digital display vacuum gauge on the right side of the furnace tube to control the vacuum degree and atmosphere environment inside the furnace tube. The system adopts PID intelligent temperature control, and the temperature control accuracy can reach ±1℃. The tube furnace adopts temperature control meter operation in operation, can preset the temperature control curve, one-button start and stop, easy to use, can simplify the experiment operation and save the experiment time. The high-vacuum molecular pump group can effectively increase the background vacuum and improve the quality of the reaction product. Technical parameters: 1. 1200℃ mini-tube furnace parameters Supply voltage AC220V, 50Hz Maximum power 2KW Heating zone Single heating zone 200mm Constant temperature zone head 100mm Heating element Heat-resistant alloy wire Thermocouple K type Operating temperature ≤1150℃ Heating rate Suggest ≤10℃/min Temperature control accuracy ±1℃ Temperature control method AI-PID 30-segment process curve, with overheat and thermocouple failure protection Furnace tube material High purity quartz Furnace tube size φ50mm O.D x 450mm L Vacuum pump Mechanical pump pumping speed 1.1L/s Ultimate vacuum 5Pa 2. Three-channel float flowmeter parameters Valve type Stainless steel needle valve Number of gas paths Three Pressure range 0.05~0.3MPa Range 160 SCCM (Air) Mixing tank volume 750mL Gas path material 304 stainless steel Pipe interface 6.35mm ferrule connector 3. Molecular pump parameters Product number CY-GZK103-A Molecular pump Turbomolecular pump Backing pump Two-stage rotary vane pump Pumping rate Molecular pump: 6000L/S Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa Rotary vane pump: 1.1L/S Ultimate vacuum 5×10E-4Pa Pumping port KF40 Exhaust interface KF16 Vacuum measurement Compound vacuum gauge

Minimum Order: 1 bags

This CVD system is specially designed for graphene production, using a 1200℃ mini tube furnace, equipped with a high-precision mass flow meter and a thin-film vacuum gauge. Compared with the conventional Pirani resistance gauge, the reading of the thin film gauge is accurate and not affected by the type of gas, which is very suitable for the vacuum coating process. At the same time, the equipment is equipped with a combustible gas detection device, which is linked with a solenoid valve at the air outlet. Once there is a leakage, the solenoid valve can be closed to ensure safety. This set of equipment has a small footprint and is very suitable for laboratory preparation of CVD. Technical parameters: 1. 200℃ Mini Tube Furnace Parameters: Supply voltage AC220V, 50Hz Maximum power 2KW Heating zone Single heating zone 200mm Constant temperature zone length 100mm Heating element Heat-resistant alloy wire Thermocouple Type K Operating temperature ≤1150℃ Heating rate Suggest ≤10℃/min Temperature control accuracy ±1℃ Temperature control method AI-PID 30-segment process curve, with overheat and burnout protection Furnace tube material High purity quartz Furnace tube size φ50mm O.D x 450mm L Vacuum pump Mechanical pump pumping speed 1.1L/s Ultimate vacuum 5Pa 2. Three-channel mass flow meter parameters: Valve type Stainless steel needle valve Number of gas paths Three Pressure range 0.05~0.3MPa Range Ar 0~500sccm H2 0~200sccm CH4 0~10sccm Flow control range ±1.5% Mixing tank volume 750mL Gas path material 304 stainless steel Pipe interface 6.35mm ferrule connector Power supply AC220V 50Hz

Minimum Order: 1 bags

This product is a plasma-enhanced rotary chemical vapor deposition system (rotating PECVD). The furnace tube adopts a variable-diameter design. The middle tube diameter is relatively thick and there are mixing partitions, which can repeatedly mix powder or particles with the rotation of the furnace tube. The working tube can be rotated 360° uninterruptedly through the mechanical transmission control, so that the materials in the tube can be stirred and mixed to obtain a uniform heating effect; the equipment is also equipped with a plasma generator, which is connected to the furnace tube by inductive coupling, and the generated plasma can cover the furnace tube effectively, increase the activation energy of the reactants, reduce the reaction temperature, and improve the reaction efficiency. The equipment is equipped with a three-way mass flow meter and a gas mixing device, which can be used to pass a variety of gases into the pipe. At the same time, the equipment is equipped with a high-performance mechanical pump that can quickly evacuate the furnace pipe to vacuum; the cooperation of the pump and the gas circuit can achieve more A CVD process. The rotating device is very suitable for continuously coating and modifying powder materials by CVD method in an atmosphere protected environment. Technical Parameters 1. Dual temperature zone tube furnace Product model CY-O1200-60IIC-R Equipment power 3KW Furnace tube material High purity quartz Furnace tube size Φ60*420+Φ100*360+Φ60*420mm (Quartz heteromorphic tube) Furnace chamber length 440mm Heating zone length 200mm+200mm Operating temperature 0～1150℃ Limit temperature 1200℃ Temperature control accuracy ±1℃ Thermocouple type K-type thermocouple Temperature control mode 30-segment program temperature control, PID parameter self-tuning Display mode HD full color LCD touch screen Sealing method 304 stainless steel vacuum flange Power supply AC: 220V 50/60Hz Rotation speed 0~13rpm Tilt angle 0~35° 2. 3-channel mass flow meter Product model CY-3Z Number of gas paths 3 channels Flowmeter type Mass flowmeter Measuring range A channel: 0~100sccm; B channel: 0~200 sccm; C channel: 0~500 sccm Measurement accuracy ±1.5% Working pressure difference 0.1~0.5MPa Pipeline interface 1/4 inch ferrule connector Power supply AC220V 50/60Hz 3. Vacuum system Vacuum pump Dual stage rotary vane pump Pumping speed 1.1L/s Pumping port KF16 Pump ultimate vacuum Power supply AC220V 50/60Hz 4. RF power supply Signal frequency 13.56MHz±0.005% Power output range 0~500W Maximum reflected power 100W RF output interface 50Ω, N-Type, female Power stability ≤5W

Minimum Order: 1 bags

Single heating zone rotary plasma CVD reactor with vacuum automatic feeder Single heating zone rotary PECVD, equipped with vacuum automatic feeder, and KF40 interface reserved at the end of the furnace tube can be connected to the receiving tank. The feeder adopts screw feeding, the powder can be fed into the furnace tube at a rated rate, and the feeding rate can be changed by adjusting the rotary speed. It can realize the continuous coating and modification of powder materials by PECVD method under the atmosphere protection environment. The receiving tank can collect the processed powder under the atmosphere protection environment. The equipment is equipped with 100W RF power at 13.56MHz. It can generate plasma in vacuum. High-energy plasma can activate the sample surface, effectively enhance the reaction effect and increase the reaction rate. This auxiliary method is widely used in scientific experiments such as graphene preparation and particle coating. This equipment is especially suitable for granular sample experiments. Through mechanical transmission, it can control the continuous rotation of the working tube 360° with adjustable rotation speed, so that the materials in the tube are continuously stirred and mixed, and fully contact with the gas and plasma, so that the reaction of the sample is more uniform and stable. Technical parameters： 1. RF power supply Output Power 150W Output accuracy ±1% RF frequency 13.56MHz RF stability ±0.005% Cooling method Air-cooling 2. 1200℃ Single heating zone tube furnace Supply voltage AC220V，50Hz Maximum power 2KW Heating zone Single heating zone 200mm Working temperature Maximum 1200 ℃, continuous operating temperature should be ≤1100 ℃ Temperature accuracy ± 1 ℃ Temperature control method AI-PID 30-stage process curve, can store multiple 3. Three temperature zone independent control, with overheat and thermocouple failure protection Furnace tube material High purity quartz Furnace tube size Dia. 50x800mm Sealing method Vacuum stainless steel flange, KF16 flange Adjustable speed 0-20rpm Tilt Angle 0-15° Vacuum pump Rotary vane mechanical pump Ultimate vacuum 1.0E-1Pa Feeding method Vacuum funnel and screw feed

Minimum Order: 1 bags