Chemical Equipment & Lab Supplies

CY-MSE310S-DCRF two-in-one coating machine can be used for coating samples of electronic products, glass, ceramic samples, metals and other samples. Especially suitable for laboratory SEM (scanning electron microscope) sample preparation. The equipment is mainly composed of quartz vacuum chamber, plasma sputtering target, evaporation coating device, sample stage for placing samples, vacuum pump unit, vacuum measuring gauge, gas intake system and control system. The main unit of the equipment adopts touch screen operation, and the temperature control meter detects. Its digital parameter interface and automatic operation mode provide users with an excellent R & D platform. The target head is at the bottom of the vacuum chamber. The sample stage has heating and rotating functions, which can make the coating effect more uniform. The equipment’s vacuum acquisition system uses the two-stage vacuum pump set. The backing pump is a large pumping speed mechanical pump, which effectively reduces the time from normal pressure to low vacuum. The main pump is a turbo molecular pump, which has a high pumping speed and a faster vacuum acquisition speed. The overall vacuum obtaining system is clean and fast. The vacuum chamber is made of 304 stainless steel and is equipped with a viewing window and a baffle. Beautiful shape, fine workmanship, excellent vacuum performance. The main sealing flange adopts CF series high vacuum sealing flange. Each joint of the vacuum chamber is sealed by a rubber seal ring, which has excellent vacuum performance and can effectively guarantee the coating quality

Minimum Order: 1 bags

The equipment uses electron beam evaporation as coating equipment. It is mainly used to prepare various conductive thin films, semiconductor thin films, ferroelectric thin films, optical thin films, micro-fabrication of micro and nano devices, sample pretreatment of electron microscopy, etc. It is especially suitable for evaporating various refractory metal materials. It can be used not only on hard substrates such as glass and silicon wafers, but also on flexible substrates such as PDMS, PTFE and PI. Technical parameters of equipment Conditions of use ambient temperature 5 ~40 C Power supply three-phase 380 V Power <20 KW Water pressure <2.5bar Vacuum chamber size evaporation chamber size: Phi 500 *H500 Electronic gun a new type of electronic gun, 6-hole crucible Sample turntable Sample size: <150mm, sample can be rotated, and the distance between sample and electron gun can be adjusted up and down (Sample holder shape is designed according to user's requirements), heating temperature <500 C. System Vacuum Limit vacuum: baked for 12 to 24 hours, continuously pumped less than 5x10-5Pa Pumping Rate: Vacuum < 5x10-4Pa within 40 minutes from atmospheric start System Leakage Rate: Measuring Vacuum Vacuum Degree of Vacuum Chamber < 10Pa after 12 hours of shutdown Vacuum pumping system FB1200 molecular pump + mechanical pump (TRP-36) system with bypass pumping Coating monitoring SQM160 film thickness meter is used for monitoring. Coating thickness The unevenness of coating thickness is less than 6%

Minimum Order: 1 bags

This equipment is a multi-source high-vacuum evaporation coating instrument. The equipment adopts a front-opening vacuum chamber design. The chamber has a large space and strong expandability, which can meet the evaporation coating of multiple types of large-size samples. The chamber has an upper sample stage inside, and the clamping or clamping type sample mounting parts can be selected according to the user's sample style. The sample table can be rotated, heated and raised and lowered, and all operations are integrated and controlled through the touch screen. The vacuum pump set of the equipment is a two-stage vacuum system, which is composed of a dual stage rotary vane vacuum pump and a turbo molecular pump. It can provide a clean and oil-free high vacuum environment for the vacuum coating test; the vacuum system contains a complete pneumatic valve system, and the user can One- touch operation through the touch screen realizes vacuuming, non-stop load and unload sample, complete shutdown and other operations. The equipment has two sets of evaporation sources. It adopts a tungsten boat evaporation source and water-cooled copper electrodes. It can support a maximum current of 300A and a heating temperature of up to 3000 ° C. It can realize the evaporation of various refractory metals. This equipment adopts an integrated design, and the chamber and the electric control part are separated left and right, which realizes the separation of water and electricity, and effectively guarantees the safety of users. The electric control part adopts the design of the combination of touch screen and button panel. The vacuum system, sample table and other auxiliary functions are operated by the touch screen with one button. The evaporation and the film thickness control are operated independently by the panel, which is as convenient for users as possible while avoiding the possibility of wrong operation. The equipment is well-designed and has excellent performance, and it is an indispensable choice for laboratory high-precision evaporation coating test. Technical parameters Sample stage Size Max support φ150mm sample Height Adjustable up and down 70mm Evaporation source Quantity Tungsten Boat x2 Vacuum chamber Chamber size:Dia. 300mm X 400mm Observation window:Front φ100mm with shading sheet Chamber material:304 stainless steel Opening method:Front door open Film thickness control Crystal vibrating film thickness measuring instrument, optional multi-channel film thickness controller Vacuum system Backing pump:Dual stage rotary vane pump Pumping port:KF16 Secondary pump:Turbo molecular pump Pumping port:CF160 Vacuum measurement Resistance + ionization Compound vacuum gauge Exhaust rate:Mechanical pump 1.1L / s Molecular pump 600L / s Ultimate vacuum:1.0E-5Pa Power supply:AC 220V 50/60Hz Pumping rate:Rotary vane pump: 1.1L / S Flowmeter One way mass flowmeter 500sccm Ar gas Control System PLC automatic control Operation interface: touch screen + operation panel Other Supply voltage:AC380V,50Hz Machine size:1000mm x 800mm x 1500mm Total power:5kW Machine weight:350kg

Minimum Order: 1 bags

Small stainless steel chamber high vacuum thermal evaporation coater The instrument is a high vacuum compact thermal evaporation coater with evaporation temperature from 200℃ to 1700℃. The tungsten wire basket is used as the evaporation source, and the evaporation source is built in at the bottom of high purity alumina crucible. The upper cover is equipped with a rotatable sample stage, which can effectively improve the uniformity of film formation. The instrument has a high-precision temperature control system and uses circulating heating method, which can stabilize the evaporation of metals and organic matter. Stainless steel high-vacuum chamber design, with high-precision molecular pump, can achieve high vacuum requirements, the high vacuum can effectively improve the efficiency and quality of the evaporation coating. Application This equipment is suitable for evaporation coating of most metals and certain organic material films. Technical parameters: Small high vacuum thermal evaporation coater Sample stage Size:Φ65mm Distance to evaporation source:60mm~100mm adjustable Rotary speed:1-20rpm adjustable Evaporation system Evaporation source:Tungsten wire basket Max temperature:1700℃ Thermocouple:S type thermocouple Vacuum chamber Chamber size:φ170mm × 200mm Observation Window:Quartz observation window φ70 Chamber material:Stainless steel Opening way:Top cover open Vacuum system Model:CY-GZK103-A Pumping interface:KF40 Exhaust interface:KF16 Molecular pump:CY-600 Backing pump:Rotary vane pump Vacuum measurement:Compound vacuum gauge Ultimate vacuum:1.0E-5Pa Pumping rate:Molecular pump: 600L/S rotary Rotary vane pump: 1.1L/S comprehensive pumping performance: 20 minutes vacuum up to: 1.0E-3pa Other parameters Supply voltage:AC220V,50Hz Dimensions:600mm×300mm×47 , 0mm Total power:.5kw Total weight：40kg

Minimum Order: 1 bags

Small temperature-controlled vacuum thermal evaporation coating machine CY-1700X-SPC-2 can set the program and precisely control the temperature to change within the range of 200℃-1500℃. During the evaporation coating of the sample, the sample stage can be rotated to obtain a more uniform film. This model of small program temperature control evaporation coating machine has a wide range of applications, can prepare a variety of metal film and organic film, so it is widely used in the preparation of electrodes and the preparation of organic light-emitting LEDs. The compact size of the instrument saves laboratory space; it is easy to operate and adaptable to different materials, so it is widely used in laboratories of universities and research institutes. Features: 1. This equipment uses a quartz chamber for easy cleaning and sample placement; 2. The sample stage can be rotated, and the coating effect can be more uniform; 3. Using tungsten wire as the heat source, the maximum temperature can reach 1700℃, and it is equipped with a special alumina boat loading sample (only used below 1600℃, if the evaporation temperature is greater than 1600℃, the sample should be placed directly in the tungsten wire basket); 4. The device can be switched to the manual adjustment state. The thermocouple is not installed inside, and the output current is directly adjusted by the manual. The temperature of the heat source can reach 2000℃, which can meet the experimental requirements for carbon plating of the sample. 5. The inert gas can be introduced into the vacuum chamber to clean the chamber, or the reaction gas can be introduced to carry out the reaction evaporation coating. 6. The air inlet is equipped with a needle valve for regulating the intake air flow.

Minimum Order: 1 bags

Small Vacuum Thermal Evaporation Coating Machine for Glove Box CY-EVP180G-GLV This small thermal evaporator can be used for vacuum evaporation deposition coating and the coating current can reach up to 100A. This type of small evaporation coating instrument has a wide range of applications and can prepare various metal thin films and some non-metal thin films, so it is widely used in electrodes and organic light emitting LED preparation. The instrument has a small size and a miniaturized design, which can effectively save laboratory space. It is specially designed for use in a glove box; it is simple to operate and has strong adaptability to different materials, making it very suitable for laboratory purchases. Characteristics: 1. Quartz chamber, easy to clean and put in samples; 2. Tungsten wire basket or tungsten boat is the heating source, the highest temperature can reach 1700℃; 3. Inert gas can be introduced into the vacuum chamber to clean the chamber, or reactive gas can be introduced to perform reactive evaporation coating. 4. The air inlet is equipped with a needle valve to adjust the air flow. Technical parameter Supply voltage AC220V，60Hz Max power 1000W Sample stage Diameterφ60mm； Quartz chamber O.Dφ180mm x I.Dφ166mm x 100mm Evaporation source Tungsten basket/tungsten boat Max temperature 1700℃ Thermocouple B-type,working temperature 200℃~1500℃ Vacuum gauge Resistance type vacuum gauge Vacuum interface KF16 Inlet interface φ6.35mm Bite type fittings Vacuum pump No, the customer provides it Dimensions 330x250x580mm

Minimum Order: 1 bags

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This equipment is equipped with a rotatable heating sample stage, which can improve the uniformity of the coating and the adhesion of the film.This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments. Technical parameter Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Heating temperature ≤500℃ Temperature control accuracy ±1℃ PID temperature control Plasma sputtering source 2 inches x3 water cooling Vacuum chamber Chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

Small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low- temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This model machine is also equipped with a rotatable sample stage, which can effectively improve the uniformity of the coating. Technical paremater Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Plasma sputtering source 2 inches x3 Natural cooling Vacuum chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments. Technical parameter Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Plasma sputtering source Quantity 2 inches x3 Cooling method Natural cooling Vacuum chamber Chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This model machine is also equipped with a rotatable sample stage, which can effectively improve the uniformity of the coating. Technical parameter Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Plasma sputtering source Quantity 2 inchesx2 Naturalcooling Vacuum chamber Chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage.This equipment is equipped with a rotatable heating sample stage, which can improve the uniformity of the coating and the adhesion of the film.This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments. Technical parameter Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Heating temperature ≤500℃ Temperature control accuracy ±1℃ PID temperature control Plasma sputtering source Quantity 2 inchesx2 Cooling method Natural cooling Vacuum chamber Chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

CY-PSP180G-2TA small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used metal coating experiment, special for SEM sample preparation Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. Technical parameter Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Heating temperature ≤500℃ Temperature control accuracy ±1℃ PID temperature control Plasma sputtering source Quantity 2 inchesx2 Cooling method Natural cooling Vacuum chamber Chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This equipment is equipped with a rotatable heating sample stage, which can improve the uniformity of the coating and the adhesion of the film.This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments. Technical parameters: Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Heating temperature ≤500℃ Temperature control accuracy ±1℃ PID temperature control Plasma sputtering source 2 inches x1 Cooling method Water cooling/Natural cooling Vacuum chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector Power configuration Quantity DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This model machine is also equipped with a rotatable sample stage, which can effectively improve the uniformity of the coating. Technical parameter Sample stage size 100mm Distance from sample stage to target surface 20~35mm height adjustable Rotating speed 1~20rpm adjustable Plasma sputtering source 2-inches x2 Cooling method Water cooling/Natural cooling Vacuum chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector Power configuration Quantity DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s（4m3/h） Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Power supply AC 220V 50Hz Total power 1.5kW/2kW Dimension 500mm x 320mm x470mm Weight 30kg

Minimum Order: 1 bags