Chemical Equipment & Lab Supplies

After being miniaturized, this model of spin coater adopts stainless steel structure, and PP chamber with transparent glass cover, which is beautiful and firm. The instrument adopts advanced precision motor, and the rotation speed can reach 10,000 rpm, which effectively guarantees the uniformity of the film formation. In addition, the instrument is controlled by a touch screen, which can preset a uniform curve, which greatly simplifies the use process and reduces the learning cost, which is very suitable for laboratory purchase. Application Scope The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in the fields of photoresist spin coating, biological medium production, and sol-gel method to produce polymer films.

Minimum Order: 1 bags

Anti-corrosion spin coater with heating cover CY-SPC8-HAR 1.This spin coater adopts PTFE chamber, which is beautiful and sturdy in appearance, has excellent chemical stability and strong corrosion resistance, and can be used in various occasions requiring acid and alkali resistance and organic solvents. 2.The device adopts advanced precision motor, the maximum speed can reach 10,000rpm, which effectively guarantees the uniformity of film formation. 3.In addition to the basic spin coating function, this product is also equipped with heating elements, which can be heated up to 200℃, temperature controlled by an intelligent temperature control meter, accurate temperature measurement, and completely controlled temperature rise process. 4.In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost. 5.It is very suitable for laboratory purchase. Application: The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Minimum Order: 1 bags

Anti-corrosion spin coater CY-SPC8-AR 1.Anti-corrosion spin coater adopts PTFE chamber, which is beautiful and sturdy in appearance, has excellent chemical stability and strong corrosion resistance, and can be used in various occasions requiring acid and alkali resistance and organic solvents. 2.Anti-corrosion spin coater adopts advanced precision motor, the maximum speed can reach 10,000rpm, which effectively guarantees the uniformity of film formation. 3.In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost. 4.It is very suitable for laboratory purchase. Anti-corrosion spin coater application: The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. 1.This spin coater adopts all-aluminum alloy chamber, which is beautiful and sturdy in appearance. 2. The device adopts advanced precision motor, the maximum speed can reach 10,000rpm, which effectively guarantees the uniformity of film formation. 3. In addition to the basic spin coating function, this product is also equipped with heating elements, which can be heated up to 200℃, temperature controlled by an intelligent temperature control meter, accurate temperature measurement, and completely controlled temperature rise process. 4. In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost. 5. It is very suitable for laboratory purchase.

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~10000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 8 inches (200mm) Chamber material Aluminum alloy Operation method 7 inches HD LCD touch screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw interface Overall size 290mm×365mm×260mm Total Weight 10kg Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

Features 1.100 grade purifying effect, can remove the dust to avoid coating sample from pollution 2.Equipped with LED lighting with programmable control, easy operate 3.Time-coating programmable control 4.LCD 7” touch panel, simple and easy operate. Technical parameter Model No. CY-GKF411 Coating time 1-99S Time accuracy ±5%  Coating speed 0-8000RPM Speed accuracy ±3%  Working station Two station Purifying Effect 100 grade(USA Federal Standard) Operating area wind speed 0.3-0.5m/s Wafer dimension 10mm-100mm wafer or other material System control PID Programmable control Outer dimension 800x680x1700mm 

Minimum Order: 1 bags

CY-SPC-HUA6 is a small and flexible spin coater, which can spray the glue on the substrate through the ultrasonic nozzle, and then evenly apply the glue on the substrate through high-speed rotation. It is also possible to directly perform the spin coating operation alone. Features 1.The chamber is equipped with heating elements, which can be baked after spinning coating 2.The product has a gas path controlled by a 2-way float flowmeter, which can pass inert gas into the chamber to protect the glue liquid from the gas in the air when spinning coating 3.This machine is suitable for surface coating of semiconductor wafer, slide, wafer, substrate, ITO conductive glass and other processes and plate making. 4.The maximum size of the crystallizable wafer is 6 inches, the rotational speed can reach 10000rpm, and the acceleration can reach 5000rpm; 5.It has the advantages of stable speed, quick start, convenient operation, etc., and can ensure the consistency and uniformity of the thickness of spinning coating.

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material Plexiglass Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material Plexiglass Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material PTFE Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material PP Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Exhaust system Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material acrylic Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

Introduction AFA-L1000 compact automatic drying tape casting coater is mainly used for laboratory coating of liquid or colloidal film. The film applicator is made of stainless steel with a constant weight to improve the uniformity of film. The device adopts bottom heat-able vacuum chuck up to 120°C, so that the film is quickly dried. It has a scraper stopper, which can adjust the length of the coated film arbitrarily, and the scraper automatically resets when it reaches the limit. The upper cover has the functions of dustproof and heat preservation, and at the same time makes the device more beautiful. Features 1. This equipment adopts a continuously variable motor to precisely control the coating speed. 2. The cross-bar can be used to push the adjustable scraper. There is no special requirement for the size of the adjustable scraper. 3. The waste collection box placed on the left edge of the vacuum chuck bed collects spare slurry to ensure the equipment itself and the surrounding area are clean. 4. The bottom intelligent vacuum heating chuck plate and digital display temperature control drying system can adapt to the development of science and technology of film formation under high temperature.

Minimum Order: 1 bags

Introduction Compact automatic tape casting drying coater is widely used in various high- temperature coating research, such as ceramic thin films, crystal thin films, battery material thin films, special nano thin films, which can adapt to the film forming technology under high temperature conditions in the future development. This automatic tape casting coater pushes the precision film applicator (wire bar or doctor blade) at a uniform speed to achieve a smooth and uniform coating effect. The speed of film applicator (wire bar or doctor blade) can be controlled according to personal needs. The substrate is fixed by vacuum adsorption, so that the substrate is free of wrinkles during the coating process, and the coating is smoother. After coating, the upper cover can heat and dry the film, and the temperature control accuracy is ±1℃. It is especially suitable for the preparation of solid electrolyte and lithium battery electrodes. Main features 1. With top automatic drying function. 2. Use vacuum adsorption to fix the substrate. 3. Uniform coating. Technical Parameters Power supply 220VAC, 50 Hz Heating power 2500W Coating speed 10mm/s-100mm/s Speed control precision 1mm/sec Heating method Top dryer Heating temperature ≤120℃ Temperature control accuracy ±1℃ Thermal uniformity Within ±1% Film applicator Doctor blade or wire bar Maximum stroke length 420mm Vacuum chuck area A4/A3 Vacuum panel size 345mm*540mm

Minimum Order: 1 bags