Chemical Equipment & Lab Supplies

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Minimum Order: 1 bags

Introduction CY-EVP180S-2S-HV is a high-vacuum evaporation coater with two sources, tungsten filament basket (or tungsten boat) is used as the evaporation source, and distance between sample table and evaporation source is adjustable. The instrument can stably evaporate metals and some organics. High-vacuum stainless steel chamber is adopted, which has good sealing performance and excellent vacuum performance. The chamber is equipped with an observation window, so the coating process is visible. Ultimate vacuum 10E-5Pa with molecular pump system, effectively improve the coating quality, and can meet the vacuum environment required for most evaporation coating experiments. Technical parameters 1. Input power AC 220V, single phase, 50Hz 2. Evaporation current 100A 3. Electrode voltage 10V 4. Evaporation source Quantity: 2 Tungsten filament basket ×2 pcs, tungsten boat ×2 pcs Evaporator baffle Yes 5. Sample holder Top setting Diameter: φ65 mm Rotating speed: 0-20 rpm The distance between sample holder and evaporation source is adjustable 6. Vacuum chamber Inner wall processing: electrolytic polishing Chamber dimension: ~φ180mm×H210mm Chamber material: 304 stainless steel Opening mode: top open 7. Temperature measurement B type thermocouple 8. Display screen 7-inch touch screen 9. Current regulation Touch screen setting, range 0~100A 10. Vacuum required Rotary vane pump or molecular pump group can be selected as required. (additional charge) Extraction interface KF25 11. Inlet interface Diameter 6mm round hole fine tuning valve 12. Thin film thickness gauge Accuracy: 0.1Ã Measurement speed: 100mS-1S adjustable Measurement range: 500 000Ã (Aluminum) Standard sensor crystal: 6MHz

Minimum Order: 1 bags

Multi-arc ion plating is the use of gas discharge or partial ionization of evaporated substances, while gas ions or particles of evaporated substances are bombarded, the evaporated substances or reactants are deposited on the substrate. Ion plating combines the glow discharge, plasma technology and vacuum evaporation organically, which not only significantly improves the film quality, but also expands the application range of the film. It has the advantages of fast evaporation rate, strong film adhesion, good diffraction, and extensive film materials. It is very suitable for plating hard protective film such as TiN. At the same time, because it can change the color of the film by controlling the atmosphere, and the film is firmly combined with the substrate, it can also be used to make decorative films of various colors Features This equipment is equipped with two multi-arc targets, which are placed on both sides of the chamber. Cooperating with the planetary sample stage can effectively improve the coating efficiency and improve the effect. The coating instrument also adopts an integrated design, the chamber and the electric control part are separated on the left and right, which realizes the separation of water and electricity, and effectively guarantees the safety of users. Technical parameter 1. Model CY-MIOP500S-2TA 2. Vacuum chamber Water cooled stainless steel chamber; φ500mm X 490mmH; Front door type, φ 100 mm quartz observation window; Built in two sets of infrared heating lamps, can be used for baking and degassing the chamber; Multiple CF interfaces are reserved for installation of multi-channel film thickness meter 3. Gas system Mass flow meter:Ar gas 0~200sccm，N2 gas 0~200sccm other flow or gas can be customized 4. Power supply AC 220V;50Hz;10kW 5. Control system 15“ touch screen configuration control software 6. Multi arc target Quantity and SPEC 2-set;3inches Installation method Chamber side, opposite Working current 0~150A Target thickness 50mm,min 20mm 7. Sample stage Specification Planetary hanger Number of samples There are 6 hanging points on each hanger, totally 6 hangers Rotation speed Revolution speed 1~20rpm 8. Vacuum system Model CY-GZK103-A Molecular pump Turbo molecular pump Backing pump Double stage rotary vane pump Pumping molecular pump：6000L/S Comprehensive pumping performance: 30 minutes vacuumdegree up to: 5×10E-3Pa Rotary vane pump：1.1L/S Ultimate vacuum 5×10E-4Pa Extraction interface KF40 Exhaust interface KF16 vacuum measurement composite vacuum gauge

Minimum Order: 1 bags

desktop double target DC magnetron sputter coating machine This equipment is a double target magnetron sputter coating machine, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc. it can also be used to prepare SEM samples in laboratory. It adopts high vacuum stainless steel chamber, front door opening design, and quartz observation window on the door, which is convenient for the observation and recording of the experiment. At the same time, the equipment is equipped with a rotary heating sample table, which can effectively improve the film uniformity and film quality. A set of baffle plate is installed on the top cover, and the two targets can be switched by rotating the baffle plate to realize multilayer coating. This equipment needs to be used together with high vacuum molecular pump group. Users can choose imported brand small molecular pump to further save installation area. At the same time, the model can be equipped with film thickness meter components, which can monitor the film thickness in real time and provide reliable parameters for the experimental process. Technical parameter 1. Sample stage Size 100mm Heating ≤500℃ Rotation speed 1-20r/min Temp control ±1℃ 2. Magnetron sputter head Quantity 2” x2 Cooling mode Water cooled 3. Vacuum chamber Size Dia 210mm× 260mm Watch window φ40mm Material SUS Open mode Front opening 4. Sputter power supply DC power supply 1 set Output power ≤300W Output voltage ≤600V response time ＜5ms 5. Water cooling Tank capacity 9L Flow 10 L/min 6. Film thickness gauge Accuracy 0.1angstrom Cooling mode Water cooling 7.Molecular pump system Backing pump Rotary vane pump Pumping 1.1L/s Secondary pump turbo molecular pump（domestic） Pumping 600L/s Extraction interface KF40 Air outlet KF16 8.Other Power supply AC220V,50Hz Total power 4kw

Minimum Order: 1 bags

Dual target DC RF magnetron sputtering coating machine---bottom target type CY-MSP500S-DCRF-B is a special laboratory coating machine with two targets developed by our company. It is equipped with a DC power supply and a RF power supply. It can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Features a.Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise; b.The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time; c.This model adopts the layout of under target, the sample table is on the top, and the height with the target surface can be precisely adjusted by program, and can be rotated and heated, with excellent performance. Technical parameter 1. Model CY-MSP500S-DCRF-B 2. Input AC220V，50Hz 3. Total power 6KW 4. Ultimate vacuum degree 5x10-4Pa 5. Sample table parameters Size 150 Dia. Height 70 mm adjustable Heating ≤500℃ Rotation speed 1-20 rpm 6. Magnetron sputtering head parameters Quantity 2-set，2-inch Cooling mode Water cooled，required flow rate10L/min Water chiller 10L/min circulating water cooling 7. Vacuum chamber Size 500mmDia. × 490mm H Material Stainless steel Watch window 100mm Dia. Open mode front opening door 8. Gas flow controller 1channel 200sccm Ar； 9. Vacuum pump Molecular pump system pumping,600L/S 10. Film thickness gauge Quartz vibrating film thickness gauge ， one set，Resolution 0.10 Å 11. Sputter power supply DC power supply：one set，500W，for metal films RF power supply：one set，500W，for non-metallic films 12. Operating mode All-in-one computer operation 13. Overall dimensions 1090mm X 900mm X 1250mm 14. Total weight 350kg

Minimum Order: 1 bags

Dual target magnetron sputtering machine with reciprocating sample stage CY-MSP500S-DCRF-RE is a laboratory-specific magnetron sputtering coater with two target positions developed by our company. The equipment is equipped with a DC power supply and a radio frequency power supply, which can be used to prepare single or multilayer iron Electrical film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc. Features a.Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and speed, high coating rate, low sample temperature rise, and is a typical high-speed low-temperature sputtering. b.The magnetron sputter target is equipped with a water-cooled interlayer. The water-cooled machine can effectively take away the heat and avoid the heat accumulation on the target surface, so that the magnetron sputter can work stably for a long time. c.The sample stage adopts a reciprocating design, and the left side is equipped with a magnetic coupling push rod, which can push the sample stage left and right. d.The whole machine adopts touch screen control, built-in one-button coating program, easy to operate, it is an ideal equipment for laboratory preparation of films Technical parameter 1. Model CY-MSP500S-DCRF-RE 2. Input AC220V，50Hz 3. Total power 6KW 4. Ultimate vacuum degree 5x10-4Pa 5. Sample table parameters Size 100mm x 100mm Reciprocating stroke 200mm 6. Magnetron sputtering head parameters Quantity 2-set，2-inch Cooling mode Water cooled，required flow rate10L/min Water chiller 10L/min circulating water cooling 7.Vacuum chamber Size φ500mm X 490mm H Material Stainless steel Watch window φ100mm Open mode front opening door 8. Gas flow controller 1channel 200sccm Ar； 9. Vacuum pump Molecular pump system pumping600L/S 10. Film thickness gauge Quartz vibrating film thickness gauge ，one set， Resolution 0.10 Å 11. Sputter power supply DC power supply：one set，500W，for preparing metal films RF power supply：one set，500W，for non - metallic coating 12. Operating mode All-in-one computer operation 13. Overall dimensions 1090mm X 900mm X 1250mm 14. Total weight 350kg

Minimum Order: 1 bags

three target rf magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. Technical parameter 1. Power supply AC220V，50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:3 Size:2” Cooling mode Water cooled，flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar； 7. Vacuum pump:A molecular pump system，pumping 600L/S 8.Quartz vibrating film thickness gauge One set， resolution 0.10 angstrom 9. Sputter power source RF power supply500W-1000W，Suitable for non - metallic films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg

Minimum Order: 1 bags

three target dc rf magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. Technical parameter 1. Power supply AC220V，50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:3 Size:2” Cooling mode Water cooled，flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar； 7. Vacuum pump:A molecular pump system，pumping 600L/S 8.Quartz vibrating film thickness gauge One set， resolution 0.10 angstrom 9. Sputter power source DC power supply:500W-1000W，Suitable for preparing metal films RF power supply500W-1000W，Suitable for non - metallic films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg

Minimum Order: 1 bags

two target dc rf magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. Technical parameter 1. Power supply AC220V，50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:2 Size:2” Cooling mode Water cooled，flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar； 7. Vacuum pump:A molecular pump system，pumping 600L/S 8.Quartz vibrating film thickness gauge One set， resolution 0.10 angstrom 9. Sputter power source DC power supply:500W-1000W，Suitable for preparing metal films RF power supply500W-1000W，Suitable for non - metallic films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg

Minimum Order: 1 bags

two target rf magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. Technical parameter 1. Power supply AC220V，50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:2 Size:2” Cooling mode Water cooled，flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar； 7. Vacuum pump:A molecular pump system，pumping 600L/S 8.Quartz vibrating film thickness gauge One set， resolution 0.10 angstrom 9. Sputter power source RF power supply500W-1000W，Suitable for non - metallic films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg

Minimum Order: 1 bags

dual target DC magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. Technical parameter 1. Power supply AC220V，50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:2 Size:2” Cooling mode Water cooled，flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar； 7. Vacuum pump:A molecular pump system，pumping 600L/S 8.Quartz vibrating film thickness gauge One set， resolution 0.10 angstrom 9. Sputter power source DC power supply:500W-1000W，Suitable for preparing metal films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg

Minimum Order: 1 bags

Single target rf magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. Technical parameter 1. Power supply AC220V，50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:1 Size:2” Cooling mode Water cooled，flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar； 7. Vacuum pump:A molecular pump system，pumping 600L/S 8.Quartz vibrating film thickness gauge One set， resolution 0.10 angstrom 9. Sputter power source RF power supply500W-1000W，Suitable for non - metallic films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg

Minimum Order: 1 bags

Single target DC magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. Technical parameter 1. Power supply AC220V，50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:1 Size:2” Cooling mode Water cooled，flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar； 7. Vacuum pump:A molecular pump system，pumping 600L/S 8.Quartz vibrating film thickness gauge One set， resolution 0.10 angstrom 9. Sputter power source DC power supply:500W-1000W，Suitable for preparing metal films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg

Minimum Order: 1 bags

Product name: Dredge Slurry Suction Hose Brand name: Ocelot Color: Black Size: 150mm--1200mm Safe factor:5:1 Length: 0.5m--30m Working temperature: -20°C to 80°C Structure: Tube: Smooth NR/ synthetic rubber, generally color is black Reinforcement: spiral fabric, steel wire spiral layer, Cover: Oil, abrasion and weather-resistant wrapped synthetic rubber. Performance: 1. Rubber hose pipes are used with dredgers for silt/gravels conveyance. 2. Pipe wall thickness range: from 20mm up to 50mm. 3. The suitable working temperature: from -20°C to +80°C. 4. Abrasion-resistant and bending –resistant. 5. It is convenient to install, flexible to use and safe.

Minimum Order: 60