RF magnetron sputtering PVD coater for insulations

Compared with similar vacuum PVD equipment, the single-target magnetron
sputtering coater is not only widely used, but also has the advantages of
small size and easy operation. It is an ideal equipment for laboratory
preparation of material films, especially suitable for research on solid
electrolyte and OLED in the laboratory.RF magnetron sputteringcan be used to
prepare single-layer ceramic films, dielectric films, optical films, oxide
films, hard films, PTFE films, and the like.

Sample stage Size:φ185mm
Temperature control accuracy:±1℃
Heating temperature:Max 500℃
Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head 2”×1 (1”,2”,3”optional)
Circulating water chiller with flow rate of 10L/min
Vacuum chamber Chamber size:φ300mm×300mm
Watch window:φ100mm
Chamber material:Stainless steel
Opening mode:Top cover removable
Mass flow meter 2 channels; measuring range 100sccm; 100sccm (can be
customized according to customer needs)
Vacuum system Model:CY-GZK103-A
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa
Power supply:AC;220V 50/60Hz
Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive
gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration RF power supply ×1;Max output power:300W
Other parameters Supply voltage:AC220V,50Hz
Overall size:600mm×650mm×1280mm
Total power:2KW
Total Weight:300kg

Minimum Order: 1 sets

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