plasma sputter and thermal evaporation two-in-one coating machine

CY-EVS180S-HV The plasma sputtering and vacuum thermal evaporation two-in-one
coating machine is equipped with DC sputtering target and thermal evaporation
assembly, which can not only be used for metal film plating by plasma sputtering,
but also obtain carbon or other metal elemental films by evaporation.
This coating machine 304 stainless steel as vacuum chamber, and the coating process
is completely visible. The instrument is equipped with two stage rotary vane vacuum
pump, which can quickly reach the vacuum degree of 1.0E-3pa, Ultimate vacuum 1.0E-
5Pa, and can meet the vacuum environment required by most evaporation coating
experiments and diode sputtering experiments.

Applications:
This instrument has small size which can save space and can be used on the test
bench. One machine has multiple purposes, which is cost-effective and very suitable
for major universities and research institutions to choose.
Scanning electron microscope sample surface gold spraying, gold steaming carbon
spraying and other operations, as well as the production of non-conductor material
test electrode.

Technical parameters:
Supply voltage AC220V，60Hz
Maximum power 1200W
Sample Stage Diameter φ65mm;
Adjustable distance from evaporation source, adjustable range 60mm-100mm
Vacuum chamber Material: 304 stainless steel O.Dφ168mm x I.Dφ160mm x 210mm
Maximum temperature 1700℃
Thermocouple B type thermocouple
Vacuum gauge Electronic vacuum gauge
Vacuum system Foreline pump: Pufa MVP030 oil-free pump, pumping speed 30L / min
Secondary pump: Leybold TURBOVAC 90iX pumping speed 90L / s
Vacuum interface KF40
Intake port 1/4 card sleeve connector
Overall size 500x350x400mm

Minimum Order: 1 sets

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