Planar Ceramic Sputtering Target

Excellent properties such as high purity, high density,Good microstructure
uniformity, excellent electrical properties.
High purity: The metal target requires very high purity, to ensure the
stability and reliability of the material.We have various purity levels to suit
your specific requirements, with the minimum purity of 99.5% up to 99.9999% for
some metals. Also have controlled specific impurities within the target.
High density: Metal targets have high density characteristics, usually up to
95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality of
materials.
High thermal conductivity: the thermal conductivity of the metal target is
particularly high, which can be cooled quickly and improve the coating speed.
Microstructure uniformity: powder metallurgy process to ensure the overall
uniformity of the target.
Excellent electrical properties: Reliable atmosphere sintering enables stable
electrical conductivity of oxides with semiconductor characteristics.

* Maximum sizes of planar target    
Thickness: 30mm (can be 60mm for round target)    

Width: max 2000mm    
Length: max 4000mm    

* Maximum sizes of rotary target    
Vacuum/Air Spraying    
Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm    
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm    
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm    
Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm    

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