Planar Alloy Sputtering Target

Planar Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition
uniformity, Uniform grain, etc.
High purity: The metal target requires very high purity, to ensure the
stability and reliability of the material.We have various purity levels to suit
your specific requirements, with the minimum purity of 99.5% up to 99.9999% for
some metals. Also have controlled specific impurities within the target
High density: Metal targets have high density characteristics, usually up to
99%, to ensure the stability and quality of materials.
Uniform grain: Controlled grain size and direction
Good composition uniformity: the component distribution is uniform, ensure the
film formation rate is uniform, film quality.

* Maximum sizes of planar target    
Thickness: 30mm (can be 60mm for round target)    
Width: max 2000mm    
Length: max 4000mm    

* Maximum sizes of rotary target    
Vacuum/Air Spraying    
Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm    
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm    
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm    
Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm    

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