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Home > Offers to Sell > Chemicals & Plastics
Contact: |
iris zhang |
Company: |
Zhengzhou CY Scientific Instrument Co., Ltd. |
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No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China |
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Zhengzhou 450000 |
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China |
Phone: |
+8637155199322 |
E-Mail: |
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Date/Time: |
1/25/21 9:06 GMT |
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lab 3-target dc magnetron co-sputtering coating machine
three target dc magnetron sputtering coating equipment Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory.
Technical parameter 1. Power supply AC220V,50Hz 2. Whole power 6KW 3. Limit Vacuum Degree 5x10-4Pa 4. Sample table parameters Size φ150mm Heat temp 500℃ max. Temp control ±1℃ Rotation speed 1-20rpm adjustable 4. Magnetron sputtering head parameters Quantity:3 Size:2” Cooling mode Water cooled,flow 10L/min required Water chiller 10L/min Circulating water cooling 5. Vacuum chamber Size φ300mm X 340mm H Material SUS Watch window φ100mm Opening mode open type, easy to replace target 6. Gas flow controller One-channel,200sccm Ar; 7. Vacuum pump:A molecular pump system,pumping 600L/S 8.Quartz vibrating film thickness gauge One set, resolution 0.10 angstrom 9. Sputter power source DC power supply:500W-1000W,Suitable for preparing metal films 10. Operating mode:All-in-one computer operation 11. Overall Dimensions 1090mm X 900mm X 1250mm 12. Total weight 350kg
Minimum Order: 1 sets
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