lab 200℃/s rapid annealing tube furnace by halogen lamp heat

RTP rapid annealing furnace

This product is a rapid annealing furnace, heated by the halogen lamp, and can be
used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitriding,
silicidation, diffusion, compound semiconductor annealing, annealing after ion
implantation, electrode alloying, crystallization and Densification, alloy melting
point analysis, film deposition, etc.
The equipment is mainly composed of quartz vacuum chamber, vacuum pump unit, water
cooling unit and control system. The control system adopts intelligent temperature
control meter control and touch screen operation. Its digital parameter interface
and automatic operation mode provide users with an excellent research and
development platform. The furnace chamber uses a left-right sliding way, and the
distance from the sample is flexibly adjustable.
The equipment is equipped with a bipolar rotary vane pump, which has the advantages
of small size, low noise, and no oil pollution.

Technical parameters:
Model: CY-O1000-100I-T-RTP
Furnace tube specifications: Inner diameter 100mm, heating temperature zone
400mm, total length 550mm
Material: high purity quartz
Heating rate: 0-200℃/s
Cooling rate: Above 200℃≤25min
Heating element: Halogen lamp
Vacuum interface: KF16
Intake port: Pagoda head, with 10mm outer diameter air hose
Flange specification : φ100 stainless steel vacuum method water cooling
flange
Water cooling interface: φ10mm quick plug connector
Vacuum system: Bipolar rotary vane pump, pumping speed 1.1L/s
Ultimate vacuum: 10-1Pa
Temperature control System: Intelligent temperature control meter temperature
control
With over-temperature protection
Temperature measurement: K-type thermocouple
Water chiller: Water tank capacity 9L, Max. lift head 10m
Intake port: φ10 Pagoda Head
Air release valve: Manual air release valve
Power requirements: 220V 50Hz, 24kW
Dimensions: 1200mm x 500mm x 480mm

Minimum Order: 1 sets

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