desktop type double target RF DC magnetron sputtering coater for lab

CY-MSP210S-RFDC desktop dual-target magnetron sputtering coating instrument. The
equipment has been miniaturized, while retaining the high-vacuum stainless steel
cavity, while simplifying other mechanisms, limiting the shape of the equipment to
the desktop level, greatly reducing the installation site requirements. The
equipment is equipped with a DC power supply and an RF power supply. The DC target
can be used for sputtering of metals and other conductive materials. The RF power
supply can be used for sputtering of various non-metals and metal oxides. The
equipment vacuum system adopts all imported vacuum pumps, with fast pumping speed,
high ultimate vacuum and excellent vacuum performance. The equipment has compact
structure, perfect functions and easy to use. It is very suitable for various
coating tests.

Technical parameter
Sample stage:Size:φ150mm;heating Up to 500℃;Rotating speed:0-20 adjustable
Magnetron sputtering target 2” x2 dual targets share a baffle
Vacuum chamber Cavity size:φ210mm X 230mm
Observation window:φ40mm
Cavity material:SS304 stainless steel
Opening method:Front door
Vacuum system Mechanical pump:Imported oil-free diaphragm pump Pumping
interface:KF16
Molecular pump:Imported molecular pump
Pumping interface:KF40
Vacuum measurement:Resistance gauge + ionization gauge
Exhaust interface:KF16
Ultimate vacuum:1.0E-3Pa
Power supply:AC 220V 50/60Hz
Pumping rate:Oil-free pump 0.49L/s Molecular pump: 40L/S
Sputtering power DC power supply x1 RF power supply x1
Maximum output power DC power supply 500W RF power supply 500W
other Supply voltage:AC220V, 50Hz
Overall size:550mm X 550mm X1100mm
Total power:2kW

Minimum Order: 1 sets

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