DC RF 3-target magnetron co-sputtering deposition coating machine

Magnetron sputtering is a kind of Physical Vapor Deposition (PVD).General sputtering
method can be used to prepare metal, semiconductor, insulator and other materials,
and has the advantages of simple equipment, easy control, large coating area and
strong adhesion.
This device can be used for preparing single-layer or multi-layer ferroelectric thin
films, conductive films, alloy films, semiconductor films, ceramic films, dielectric
films, optical films, oxide films, hard films, PTFE films, and the like. Compared
with similar equipment, this three-target magnetron sputtering coater is not only
widely used, but also has the advantages of small size and easy operation, and is an
ideal equipment for preparing material films in a laboratory.

Minimum Order: 1 sets

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