Labs

CY-SPC4-A The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameter Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material 304 stainless steel Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz