all-aluminum alloy chamber 10000 rpm spin coater for 8-inch

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals,
quartz, ceramics and other substrates to form thin films. It is mainly used in
photoresist spin coating, biological medium preparation, sol-gel method for polymer
film production, etc.

Technical parameters:
Supply voltage AC220V, 50Hz
Spin speed 0~10000rpm
Acceleration 100~5000rpm/s
Speed resolution 1rpm
Single step time 3000s
Substrate size Diameter ≤ 8 inches (200mm)
Chamber material Aluminum alloy
Operation method 7 inches HD LCD touch screen
Dispensing method Manual dispensing, optional precision syringe pump
Coating curve 5 segments per curve, a total of 5 curves can be stored
Pumping port Φ8mm quick screw interface
Overall size 290mm×365mm×260mm
Total Weight 10kg
Vacuum pump Dry mechanical pump
Pumping rate 1.1L/s
Power supply AC220V 50/60Hz

Minimum Order: 1 sets

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