acrylic chamber 8000rpm spin coater for 4-inch wafer

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals,
quartz, ceramics and other substrates to form thin films. It is mainly used in
photoresist spin coating, biological medium preparation, sol-gel method for polymer
film production, etc.

Technical parameters:
Supply voltage AC220V, 50Hz
Spin speed 0~8000rpm
Acceleration 100~5000rpm/s
Speed resolution 1rpm
Single step time 3000s
Substrate size Diameter ≤ 4 inches (100mm)
Chamber material acrylic
Operation method Button + LCD screen
Dispensing method Manual dispensing, optional precision syringe pump
Coating curve 5 segments per curve, a total of 5 curves can be stored
Pumping port Φ8mm quick screw joint
Overall size 210mm×250mm×180mm
Total Weight 8kg
Vacuum pump Dry mechanical pump
Pumping rate 1.1L/s
Power supply AC220V 50/60Hz

Minimum Order: 1 sets

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