3 zone 1200 ℃ vacuum CVD reactor for CNT

Chemical vapor deposition (CVD) refers to the method of chemical gas or steam
reacting on the substrate surface to synthesize coatings or nano materials. It is
the most widely used technology in semiconductor industry to deposit a variety of
materials, including a wide range of insulating materials, most metal materials and
metal alloy materials.

CY-O1200-50IIIT-3Z-HV 1200℃ three heating zone high vacuum CVD system consists of
a three-heating zone tube furnace, a three-channel mass flow meter and a high
vacuum molecular pump set.
It is suitable for high-temperature sintering, metal annealing, quality inspection,
etc. in universities, research institutes, industrial and mining enterprises,
especially for CVD experiments that require a variety of gas mixing atmospheres.

Vacuum tube furnace Model CY-O1200-50IIIT
Tube material High purity quartz
Tube diameter 50mm (Optional 60mm, 80mm, 100mm)
Tube length 1300mm
Furnace chamber length 1060mm
Heating zone length 300mm+300mm+300mm
Operating temperature 0～1100℃
Temperature control   accuracy ±1℃
Temperature control   mode 30 or 50 segment program temperature
control
Display mode LCD
Sealing method 304 stainless steel vacuum flange
Flange interface 1/4" ferrule connector, KF16/25/40 joint
Vacuum 4.4E-3Pa
Power supply AC:220V 50/60Hz
Gas supply system Model CY-3Z
Gas channel 3-channel
Measuring unit Gas mass flow meter
Measuring range A channel: 0～100 SCCM H2 gas Remarks: If you need other
ranges or gas types, you need to specify when ordering. According to the customer's
specific requirements, the flow meter of the corresponding gas type and range can
be selected.
B channel: 0～300SCCM N2 gas
C channel: 0～500SCCM Ar gas
measurement accuracy ±1.0%F.S
Pipe pressure   resistance 3MPa
Working pressure   difference 50～300KPa
Connecting pipe 304 stainless steel
Gas channel 304 stainless steel needle valve
Interface specification 1/4" ferrule connector for gas inlet and outlet
Exhaust system Model CY-GZK103-A
Molecular pump CY-600
Backing pump Rotary vane pump
Pumping rate Molecular pump: 600L/S Comprehensive gas pumping
performance: 30 minutes vacuum can reach: 1.0E-3Pa
Rotary vane pump: 1.1L/S
Pumping interface KF40
Exhaust interface KF16
Vacuum measurement Compound vacuum gauge: Resistance gauge +
ionization gauge
Ultimate vacuum 1.0E-5Pa
Power supply AC:220V 50/60Hz

Minimum Order: 1 sets

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