3-target plasma sputtering coating machine for non-conductive sample

This type of small plasma sputtering coating machine adopts two-stage sputtering
method, which is widely used for SEM sample preparation or metal coating
experiment. Using low-temperature plasma sputtering process, there is no high
temperature during the coating process, and it is not easy to produce thermal
damage. This small plasma sputtering instrument uses a PLC control system, all
touch screen operation, easy to learn and use. The equipment is small in size and
beautiful in appearance, making it the best choice for laboratory coating
experiments.

Technical parameter
Sample stage size 100mm
Distance from sample stage to target surface 20~35mm height adjustable
Plasma sputtering source Quantity 2 inches x3 Cooling method Natural
cooling
Vacuum chamber Chamber size φ180mm x 210mm
Observation window Omnidirectional visibility
Chamber material High purity quartz
Open method Top cover removable
Upper and lower cover material 304 stainless steel
Pumping port KF16
Intake port 1/4 inch ferrule connector
DC power supplyx1 Output power Max. 150W
Sputtering power 1200V
Max. sputtering current 50mA
Vacuum pump type Dual-stage rotary vane vacuum pump
Pumping port KF16
Exhaust interface KF16
Pumping rate 1.1L/s（4m3/h）
Ultimate vacuum ≥0.1Pa
Vacuum measurement Resistance vacuum gauge
Power supply AC 220V 50Hz
Total power 1.5kW/2kW
Dimension 500mm x 320mm x470mm
Weight 30kg

Minimum Order: 1 sets

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