2-target RF magnetron sputtering coater with film thickness gauge

Dual-target RF magnetron sputtering coater can be used for preparing single-layer
or multi-layer ferroelectric thin films, conductive films, alloy films,
semiconductor films, ceramic films, dielectric films, optical films, oxide films,
hard films, PTFE films, and the like. Compared with similar equipment, the dual-
target magnetron sputtering coater is not only widely used, but also has the
advantages of small size and easy operation, and is an ideal equipment for
preparing material films in a laboratory.

In addition, this machine is equipped with two high precision film thickness
gauges, which can meet the film thickness detection requirements during the coating
process. If customers need to install multiple film thickness gauges, also can
contact our technical staff for customization.

Technical parameter
Sample stage Size:φ185mm
Temperature control accuracy:±1℃
Heating temperature:Max 500℃
Rotate speed:1-20rpm adjustable
Magnetron Sputtering   target head Quantity:2”×2 (1”,2” optional)
Water chiller:Circulating water chiller   with flow rate of 10L/min
Vacuum chamber Chamber size:φ300mm×300mm
Watch window:φ100mm
Chamber material:Stainless steel
Opening mode:Top cover open
Mass flowmeter 2 channels; measuring range 100sccm; 100sccm (can be customized
according to customer needs)
Vacuum system Model:CY-GZK103-A
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa
Power supply:AC;220V 50/60Hz
Pumping rate:Molecular pump:   600L/S   rotary vane pump: 1.1L/S  
Comprehensive gas pumping performance:   vacuum up to 1.0E-3Pa in 20 minutes
Power configuration RF power supply×1;Max output power:RF 300 W
DC power supply×1;Max output power:RF 500 W
Other parameters Supply voltage:AC220V,50Hz
Overall size:600mm×650mm×1280mm
Total power:2.5KW
Total Weight:About 300kg

Minimum Order: 1 sets

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