1200℃ 2 zone vacuum CVD reactor for graphene layer growth

Chemical vapor deposition (CVD) refers to a method in which chemical gases or steam
react on the surface of a substrate to synthesize coatings or nanomaterials. It is
the most widely used technology in the semiconductor industry to deposit a variety
of materials, including a wide range of insulating materials, Most metal materials
and metal alloy materials.
CY-O1200-50IIT-3F-HV 1200℃ two heating zone high vacuum CVD system consists of a
two-heating zone tube furnace, a three-channel float flow meter and a high vacuum
molecular pump set.It is suitable for high-temperature sintering, metal annealing,
quality inspection, etc. in universities, research institutes, industrial and
mining enterprises, especially for CVD experiments that require a variety of gas
mixing atmospheres.

Vacuum tube furnace Model CY-O1200-50IIT
Tube material High purity quartz
Tube diameter 50mm (Optional 60mm, 80mm, 100mm)
Tube length 1000mm
Furnace chamber length 440mm
Heating zone length 200mm+200mm
Operating temperature 0～1100℃
Temperature control   accuracy ±1℃
Temperature control mode 30 or 50 segment program temperature
control
Display mode LCD
Sealing method 304 stainless steel vacuum flange
Flange interface 1/4" ferrule connector, KF16/25/40 joint
Vacuum 4.4E-3Pa
Power supply AC:220V 50/60Hz
Gas supply system Model CY-3F
Gas channel 3-channel
Measuring unit Gas float flow meter
Measuring range A channel: 0～100ml H2 gas Remarks: If you need  
other ranges or gas types, you need to specify when ordering. According to the
customer's specific requirements, the flow meter of the corresponding gas type and
range can be selected.
B channel: 16～160ml N2 gas
C channel: 25～250ml Ar gas
measurement accuracy ±2.0%
Pipe pressure   resistance 3MPa
Working pressure  difference 50～300KPa
Connecting pipe 304 stainless steel
Gas channel 304 stainless steel needle valve
Interface specification 1/4" cutting sleeve joint for gas inlet and outlet
Exhaust system Model CY-GZK103-B
Molecular pump CY-600
Backing pump Rotary vane pump
Pumping rate Molecular pump: 600L/S Comprehensive gas   pumping
performance: 30 minutes vacuum can reach: 1.0E-3Pa
Rotary vane pump: 1.1L/S
Pumping interface KF40
Exhaust interface KF16
Vacuum measurement Compound vacuum gauge: Resistance gauge +
ionization gauge
Ultimate vacuum 1.0E-5Pa
Power supply AC:220V 50/60Hz

Minimum Order: 1 sets

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